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2014 | 126 | 1 | 346-347
Article title

Study of Niobium Thin Films under Pressure

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EN
Abstracts
EN
Niobium is widely used in many important superconducting applications. At ambient pressure, bulk Nb has the highest critical temperature, T_c ≈ 9.25 K among the superconducting elements. Thin films of Nb show several differences in behavior in comparison with bulk Nb, e.g. substantial increase in the upper critical field (H_{C2}). Critical temperature of superconducting transition is usually lower for thin films than in bulk sample and depends on thickness of the film, size of grains etc. We prepared 100 nm thick niobium thin films in the high vacuum DC magnetron sputtering system, with T_c=8.95 K at ambient pressure. In this study, we performed measurements of superconducting transition temperature by electrical resistivity measurements of Nb thin film under hydrostatic pressure of up to 30 kbar. We observed an increase of T_c with increasing value of pressure (dT_c/dp=7.3 mK/kbar). On the other side in the case of bulk sample of Nb we observed a decrease of T_c value (dT_c/dp=-2.5 mK/kbar) with increasing applied pressure. Difference in superconducting properties between niobium bulk and thin film under pressure is discussed.
Keywords
EN
Year
Volume
126
Issue
1
Pages
346-347
Physical description
Dates
published
2014-07
References
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Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv126n1167kz
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