Influence of Low Temperature Annealing on the Magnetic and Structural Properties of Fe_{61}Co_{10}Y_{8}W_{1}B_{20} Alloy

• Authors: P. Pietrusiewicz , M. Nabiałek , M. Szota , M. Dośpiał , K. Gruszka
• Languages of publication: EN

Abstracts

EN

In alloy materials, the onset of crystallization temperature (T_{x}) is treated as the threshold of structural stability. In amorphous materials, this threshold is the temperature above which heterogeneous crystalline grains begin to appear. However, in amorphous materials, frozen nuclei of the crystalline grains also come into existence during the production process. These nuclei have a strong influence on the properties of the amorphous materials. The growth of the nuclei of the crystalline grains is possible even below the crystallization temperature, and maintaining control over their size allows the application properties, for example the magnetic properties, to be controlled. In this paper, the influence of two-stage isothermal annealing (below the crystallization temperature) on the structure and magnetic properties of Fe_{61}Co_{10}Y_{8}W_{1}B_{20} alloy was investigated. Samples of the material were prepared in the form of plates, and subjected to thermal treatment at temperatures of 700 K and 770 K, for 1 and 3.5 hours, respectively.

Keywords

EN

61.43.-j; 61.43.Dq; 75.50.Kj; 75.60.Ej; 81.40.Ef

Discipline

• 61.43.-j: Disordered solids(see also 81.05.Gc Amorphous semiconductors, 81.05.Kf Glasses, and 81.05.Rm Porous materials; granular materials in materials science; for photoluminescence of disordered solids, see 78.55.Mb and 78.55.Qr)
• 81.40.Ef: Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization
• 75.60.Ej: Magnetization curves, hysteresis, Barkhausen and related effects(for hysteresis in ferroelectricity, see 77.80.Dj)
• 75.50.Kj: Amorphous and quasicrystalline magnetic materials
• 61.43.Dq: Amorphous semiconductors, metals, and alloys

• Journal: Acta Physica Polonica A
• Year: 2014
• Volume: 126
• Issue: 1
• Pages: 110-111

Dates

published

2014-07

Contributors

author

P. Pietrusiewicz

• Faculty of Materials Processing Technology and Applied Physics, Czestochowa University of Technology; 19 Armii Krajowej Ave., 42-200 Częstochowa, Poland.

author

M. Nabiałek

• Faculty of Materials Processing Technology and Applied Physics, Czestochowa University of Technology; 19 Armii Krajowej Ave., 42-200 Częstochowa, Poland.

author

M. Szota

• Faculty of Materials Processing Technology and Applied Physics, Czestochowa University of Technology; 19 Armii Krajowej Ave., 42-200 Częstochowa, Poland.

author

M. Dośpiał

• Faculty of Materials Processing Technology and Applied Physics, Czestochowa University of Technology; 19 Armii Krajowej Ave., 42-200 Częstochowa, Poland.

author

K. Gruszka

• Faculty of Materials Processing Technology and Applied Physics, Czestochowa University of Technology; 19 Armii Krajowej Ave., 42-200 Częstochowa, Poland.

References

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Identifiers

DOI

10.12693/APhysPolA.126.110