Magnetic Relaxations in Amorphous Fe_{61}Co_{10}Y_{8}Zr_{1}B_{20} Alloy

• Authors: P. Pietrusiewicz , K. Błoch , J. Gondro , M. Nabiałek , M. Dośpiał , M. Szota
• Languages of publication: EN

Abstracts

EN

Effects of annealing on the disaccommodation phenomenon in bulk metallic glasses (BMGs), obtained by injection-casting method have been studied. The amorphous structure has been confirmed using X-ray diffractometer. The annealing process has been performed at temperature below the crystallization temperature. For all investigated samples the disaccommodation curves have been determined. The susceptibility and its disaccommodation have been used in order to define thermal and time stability of magnetic properties. Obtained results have also been used to determine activation energies of elementary processes.

Keywords

EN

75.60.Lr; 75.50.-y; 75.50.Kj; 75.30.Cr

Discipline

• 75.30.Cr: Saturation moments and magnetic susceptibilities
• 75.50.-y: Studies of specific magnetic materials
• 75.60.Lr: Magnetic aftereffects
• 75.50.Kj: Amorphous and quasicrystalline magnetic materials

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2014
• Volume: 126
• Issue: 1
• Pages: 106-107

Dates

published

2014-07

Contributors

author

P. Pietrusiewicz

• Czestochowa University of Technology, Faculty of Materials Processing Technology and Applied Physics, Institute of Physics, al. Armii Krajowej 19, 42-200 Częstochowa, Poland

author

K. Błoch

• Czestochowa University of Technology, Faculty of Materials Processing Technology and Applied Physics, Institute of Physics, al. Armii Krajowej 19, 42-200 Częstochowa, Poland

author

J. Gondro

• Czestochowa University of Technology, Faculty of Materials Processing Technology and Applied Physics, Institute of Physics, al. Armii Krajowej 19, 42-200 Częstochowa, Poland

author

M. Nabiałek

• Czestochowa University of Technology, Faculty of Materials Processing Technology and Applied Physics, Institute of Physics, al. Armii Krajowej 19, 42-200 Częstochowa, Poland

author

M. Dośpiał

• Czestochowa University of Technology, Faculty of Materials Processing Technology and Applied Physics, Institute of Physics, al. Armii Krajowej 19, 42-200 Częstochowa, Poland

author

M. Szota

• Czestochowa University of Technology, Faculty of Materials Processing Technology and Applied Physics, Materials Engineering Institute, al. Armii Krajowej 19, 42-200 Częstochowa, Poland

References

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Identifiers

DOI

10.12693/APhysPolA.126.106