Influence of the Oxygen Plasma Treatment on Carbon Electrode and Capacity of Supercapacitors

• Authors: Z. Kavaliauskas , L. Marcinauskas , V. Valincius
• Languages of publication: EN

Abstracts

EN

Amorphous carbon electrodes were deposited using atmospheric pressure plasma torch from the mixture of argon and acetylene gases on the stainless steel substrates. The ratio of Ar/C_2H_2 was in the range of 15-55. The deposited coatings were immersed in low pressure oxygen plasma for 1 min. Scanning electron microscopy images show that when Ar/C_2H_2 ratio increases from 15 to 55, the electrodes surface roughness decreases. The Raman scattering spectroscopy results indicated that the I_{D}/I_{G} ratio decreases from 2.04 to 1.35. It was observed that with the increase of Ar/C_2H_2 ratio from 15 to 55, the capacity of supercapacitor increases from 16 mF to 36 mF. The electric capacity of capacitors has increased up to 7 times after their exposure in oxygen plasma.

Keywords

EN

81.15.-z; 81.05.U-; 68.55.J-

Discipline

• 81.05.U-: Carbon/carbon-based materials(for carbon-based superconductors, see 74.70.Wz)
• 68.55.J-: Morphology of films
• 81.15.-z: Methods of deposition of films and coatings; film growth and epitaxy(for structure of thin films, see 68.55.-a; see also 85.40.Sz Deposition technology in microelectronics; for epitaxial dielectric films, see 77.55.Px)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2014
• Volume: 125
• Issue: 6
• Pages: 1316-1319

Dates

published

2014-06

Contributors

author

Z. Kavaliauskas

• Lithuanian Energy Institute, Plasma Processing Laboratory, Breslaujos 3, LT-4440, Kaunas, Lithuania
• Kaunas University of Applied Sciences, Faculty of Technology, Pramones 20, LT-50468, Kaunas, Lithuania

author

L. Marcinauskas

• Lithuanian Energy Institute, Plasma Processing Laboratory, Breslaujos 3, LT-4440, Kaunas, Lithuania
• Kaunas University of Technology, Department of Physics, Studentu 50, LT-51368, Kaunas, Lithuania

author

V. Valincius

• Lithuanian Energy Institute, Plasma Processing Laboratory, Breslaujos 3, LT-4440, Kaunas, Lithuania

References

• [1] R. Kotz, M. Carlen, Electrochim. Acta 45, 2483 (2000), doi: 10.1016/S0013-4686(00)00354-6
• [2] A.G. Pandolfo, A.F. Hollenkamp, J. Power Sources 157, 11 (2006), doi: 10.1016/j.jpowsour.2006.02.065
• [3] V.V.N. Obreja, Physica E 40, 2596 (2008), doi: 10.1016/j.physe.2007.09.044
• [4] Y.L. Tai, H. Teng, Carbon 42, 2335 (2004), doi: 10.1016/j.carbon.2004.03.032
• [5] K. Kierzek, E. Frackowiak, G. Lota, G. Gryglewicz, J. Machnikowski, Electrochim. Acta 49, 515 (2004), doi: 10.1016/j.electacta.2003.08.026
• [6] Y.F. Su, Y. Wu, L.Y. Bao, Z.H. Yang, New Carbon Materials 22, 53 (2007), doi: 10.1016/S1872-5805(07)60007-9
• [7] H. Liu, P. He, Z. Li, Y. Liu, J. Li, Electrochim. Acta 51, 1925 (2006), doi: 10.1016/j.electacta.2005.06.034
• [8] H. Li, Y. Li, R. Wang, R. Cao, J. Alloys Comp. 481, 100 (2009), doi: 10.1016/j.jallcom.2009.03.058
• [9] E. Ito, S. Mozia, M. Okuda, T. Nakano, M. Toyoda, M. Inagaki, New Carbon Mater. 22, 321 (2007), doi: 10.1016/S1872-5805(08)60003-7
• [10] G. Lota, J. Tyczkowski, R. Kapica, K. Lota, E. Frackowiak, J. Power Sources 22, 195 (2010), doi: 10.1016/j.jpowsour.2009.12.019
• [11] X. Li, B. Wei, Nano Energy 2, 2 (2013), doi: 10.1016/j.nanoen.2012.09.008
• [12] L. Marcinauskas, Ž. Kavaliauskas, V. Valinčius, J. Mater. Sci. 10, 28 (2012), doi: 10.1016/S1005-0302(12)60153-4
• [13] Z. Kavaliauaskas, L. Macinauskas, P. Valatkevicius, Acta Phys. Pol. A 119, 253 (2011)
• [14] L. Marcinauskas, A. Grigonis, V. Valinčius, J. Non-Cryst. Solids 355, 1240 (2009), doi: 10.1016/j.jnoncrysol.2009.05.009
• [15] L. Marcinauskas, A. Grigonis, V. Valinčius, P. Valatkevičius, High Temp. Mater. Proc. 13, 137 (2009)

Identifiers

DOI

10.12693/APhysPolA.125.1316