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2013 | 124 | 5 | 858-861
Article title

X-Ray Photoelectron Spectroscopy Study of Nitrogen and Aluminum-Nitrogen Doped ZnO Films

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EN
Abstracts
EN
Undoped, nitrogen-doped and aluminum-nitrogen co-doped ZnO films were deposited on Si substrates by magnetron sputtering using layer-by-layer method of growth. X-ray photoelectron spectroscopy was employed to characterize electronic properties of undoped and nitrogen doped ZnO films. The effects of N and N-Al incorporation into the ZnO matrix on the X-ray photoelectron spectroscopy core-level and valence-band spectra of the films were studied and discussed.
Keywords
EN
Contributors
  • I. Frantsevich Institute for Problems of Material Science, National Academy of Science of Ukraine, Kyiv, Ukraine
author
  • I. Frantsevich Institute for Problems of Material Science, National Academy of Science of Ukraine, Kyiv, Ukraine
author
  • I. Frantsevich Institute for Problems of Material Science, National Academy of Science of Ukraine, Kyiv, Ukraine
author
  • V. Bakul Institute for Superhard Materials, National Academy of Science of Ukraine, Kyiv, Ukraine
author
  • I. Frantsevich Institute for Problems of Material Science, National Academy of Science of Ukraine, Kyiv, Ukraine
author
  • I. Frantsevich Institute for Problems of Material Science, National Academy of Science of Ukraine, Kyiv, Ukraine
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv124n531kz
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