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2013 | 123 | 5 | 939-942

Article title

Effect of Cu Negative Ion Implantation on Physical Properties of Zn_{1-x}Mn_xTe Films

Content

Title variants

Languages of publication

EN

Abstracts

EN
The paper deals with the investigations of structural properties of Zn_{1-x}Mn_xTe films, which were fabricated under various deposition conditions using the thermal evaporation method in a closed volume. The surface morphology of the samples was studied, the phase analysis of their structures was performed, the elemental analysis of the films and the crystal lattice constant were investigated. The texture perfection of the films before and after copper ion implantation was evaluated.

Keywords

EN

Year

Volume

123

Issue

5

Pages

939-942

Physical description

Dates

published
2013-05

Contributors

author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • National Institute for Materials Science, Tsukuba, Ibaraki, Japan
author
  • National Institute for Materials Science, Tsukuba, Ibaraki, Japan
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Lublin University of Technology, Nadbystrzycka 38a, 20-618 Lublin, Poland

References

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  • 17. D.I. Kurbatov, V.V. Kosyak, M.M. Kolesnyk, A.S. Opanasyuk, S.N. Danilchenko, Yu.P. Gnatenko, Mater. Chem. Phys. 138, 731 (2013)
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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv123n541kz
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