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2013 | 123 | 5 | 939-942
Article title

Effect of Cu Negative Ion Implantation on Physical Properties of Zn_{1-x}Mn_xTe Films

Content
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Languages of publication
EN
Abstracts
EN
The paper deals with the investigations of structural properties of Zn_{1-x}Mn_xTe films, which were fabricated under various deposition conditions using the thermal evaporation method in a closed volume. The surface morphology of the samples was studied, the phase analysis of their structures was performed, the elemental analysis of the films and the crystal lattice constant were investigated. The texture perfection of the films before and after copper ion implantation was evaluated.
Keywords
EN
Publisher

Year
Volume
123
Issue
5
Pages
939-942
Physical description
Dates
published
2013-05
Contributors
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • National Institute for Materials Science, Tsukuba, Ibaraki, Japan
author
  • National Institute for Materials Science, Tsukuba, Ibaraki, Japan
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Sumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine
author
  • Lublin University of Technology, Nadbystrzycka 38a, 20-618 Lublin, Poland
References
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv123n541kz
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