Current-Voltage Characteristic Features of Diodes Irradiated with 170~MeV Xenon Ions

• Authors: N. Poklonski , N. Gorbachuk , Vo Nha , M. Tarasik , S. Shpakovski , V. Filipenia , V. Skuratov , A. Wieck , T. Kołtunowicz
• Languages of publication: EN

Abstracts

EN

Diodes manufactured on the wafers of single-crystalline silicon uniformly doped with phosphorus are studied. The wafer resistivity was 90 Ω cm. Xenon ions were implanted into the diodes from the side of the p^{+}-region (implantation energy 170 MeV, fluence Φp from 5 × 10^7 to 10^9 cm^{-2}). It is shown that the formation of a continuous irradiation damaged layer with the thickness of the order of magnitude of the average projective range creates prerequisites for the negative differential resistance in the current-voltage characteristics of the irradiated diodes.

Keywords

EN

72.20.Jv; 61.80.Fe

Discipline

• 61.80.Fe: Electron and positron radiation effects
• 72.20.Jv: Charge carriers: generation, recombination, lifetime, and trapping

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2013
• Volume: 123
• Issue: 5
• Pages: 926-928

Dates

published

2013-05

Contributors

author

N. Poklonski

• Belarusian State University, 4 Nezavisimosti Ave., BY-220030, Minsk, Belarus

author

N. Gorbachuk

• Belarusian State University, 4 Nezavisimosti Ave., BY-220030, Minsk, Belarus

author

Vo Nha

• Belarusian State University, 4 Nezavisimosti Ave., BY-220030, Minsk, Belarus

author

M. Tarasik

• Belarusian State University, 4 Nezavisimosti Ave., BY-220030, Minsk, Belarus

author

S. Shpakovski

• JSK Integral, 12 Korzhenevskogo St., BY-220108 Minsk, Belarus

author

V. Filipenia

• JSK Integral, 12 Korzhenevskogo St., BY-220108 Minsk, Belarus

author

V. Skuratov

• Joint Institute for Nuclear Research, 6 Joliot-Curie, RU-141980 Dubna, Russia

author

A. Wieck

• Ruhr-Universitaet Bochum, 150 Universitaetsstr, D-44780 Bochum, Germany

author

T. Kołtunowicz

• Lublin University of Technology, Nadbystrzycka 38d, 20-618 Lublin, Poland

References

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• 2. M. Lampert, P. Mark, Current Injection in Solids, Academic Press, New York 1970
• 3. G.S. Gildenblat, S.S. Cohen, Int. J. Electron. 63, 375 (1987)
• 4. M. Nastasi, J.W. Mayer, Ion Implantation and Synthesis of Materials, Springer, Berlin 2006
• 5. A.R. Chelyadinskii, F.F. Komarov, Phys Usp. 46, 789 (2003)
• 6. E. Barsoukov, J.R. Macdonald, Impedance Spectroscopy: Theory Experiment and Applications, Wiley, New York 2005
• 7. N.A. Poklonski, N.I. Gorbachuk, M.I. Tarasik, S.V. Shpakovski, V.A. Filipenia, V.A. Skuratov, A. Wieck, T.N. Kołtunowicz, Acta Phys. Pol. A 120, 111 (2011)
• 8. N.A. Poklonski, N.I. Gorbachuk, S.V. Shpakovski, V.A. Filipenia, S.B. Lastovskii, V.A. Skuratov, A. Wieck, V.P. Markevich, Microelectron. Reliabil. 50, 813 (2010)

Identifiers

DOI

10.12693/APhysPolA.123.926