Water Vapor-Plasma-Enhanced Oxidation of Thin Titanium Films

• Authors: L. Pranevicius , S. Tuckute , L. Pranevicius , K. Gedvilas
• Languages of publication: EN

Abstracts

EN

It is shown that the water vapor plasma processing offers modified Ti oxidation thermodynamics and kinetics over conventional, thermal oxidation. The 0.3-0.6 μm thick Ti films were sputter-deposited on silicon substrates and subsequently treated with low-pressure water vapor plasma at room temperature under continuous injection of water cloud vapor into the vacuum chamber from the heated water container. The changes of microstructure, phase composition, elemental composition and surface morphology upon the RF-power dissipated in plasma and treatment duration were investigated. We conclude that oxygen diffusion is enhanced in the presence of water vapor plasma, and deduce that fast H^+ transients because of their high mobility may be responsible for oxygen diffusion enhancement. This phenomenon can be explained as the result of two coexisting and competing reactions of oxidation and reduction on the surface. The different plasma reduction/oxidation state on the surface can be maintained by coordinated adjustment of an intensity of plasma radiation. Analysis of the experimental results is used to obtain important insights into the behavior of water molecules adsorbed on the oxidized titanium surfaces exposed to water vapor plasma at room temperature.

Keywords

EN

81.15.Cd; 68.47.Gh; 81.65.Mq; 66.30.jj

Discipline

• 68.47.Gh: Oxide surfaces
• 66.30.jj: Diffusion of water
• 81.65.Mq: Oxidation(see also 64.75.Lm Phase separation and segregation in oxidation)
• 81.15.Cd: Deposition by sputtering

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2013
• Volume: 123
• Issue: 5
• Pages: 907-910

Dates

published

2013-05

Contributors

author

L. Pranevicius

• Department of Physics, Vytautas Magnus University, 8 Vileikos St., LT-44404 Kaunas, Lithuania

author

S. Tuckute

• Department of Physics, Vytautas Magnus University, 8 Vileikos St., LT-44404 Kaunas, Lithuania
• Lithuanian Energy Institute, 3 Breslaujos St., LT-44403 Kaunas, Lithuania

author

L. Pranevicius

• Department of Physics, Vytautas Magnus University, 8 Vileikos St., LT-44404 Kaunas, Lithuania
• Lithuanian Energy Institute, 3 Breslaujos St., LT-44403 Kaunas, Lithuania

author

K. Gedvilas

• Department of Physics, Vytautas Magnus University, 8 Vileikos St., LT-44404 Kaunas, Lithuania

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Identifiers

DOI

10.12693/APhysPolA.123.907