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2013 | 123 | 5 | 837-839
Article title

Application of DC Magnetron Sputtering for Creation of Gas-Sensitive Indium Oxide Thin Films and Their Properties

Content
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Languages of publication
EN
Abstracts
EN
In this paper the technology of gas sensitive semiconductor structures based on indium oxide thin films by DC magnetron sputtering of indium with the subsequent thermal oxidation is developed. Structure, surface morphology and chemical composition of the obtained films have been investigated by electron diffraction, scanning electron microscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy. Conditions of In_2O_3 films formation with high selectivity and sensitivity to NO_2, and NH_3 are established.
Keywords
EN
Year
Volume
123
Issue
5
Pages
837-839
Physical description
Dates
published
2013-05
References
  • 1. V. Luhin, V. Zarapin, I.M. Zharsky, P. Zukovski, M. Kolasik, C. Kozak, Elektronika - Konstrukcje Technologie Zastosowania 6, 262 (2008) (in Polish)
  • 2. V. Luhin, I.M. Zharsky, P. Zukovski, J. Partyka, PrzeglÄ…d Elektrotechniczny 84, 174 (2008) (in Polish)
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv123n513kz
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