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In this study, tin film was thermally evaporated onto a stainless steel substrate in an argon atmosphere. The tin films were then subjected to a DC plasma oxidation process using an oxygen/argon gas mixture. Three different substrate temperatures (100°C, 150°C, and 200°C) and three different oxygen partial pressures (12.5%, 25%, and 50%) were used to investigate the physical and microstructural properties of the films. The surface properties were studied by scanning electron microscopy, X-ray diffraction, atomic force microscopy and a four-point probe electrical resistivity measurement. The grain size and texture coefficient of the tin oxide films were calculated. Both SnO and SnO_2 films with grain sizes of 13-43 nm were produced, depending on the oxygen partial pressure. SnO films have flower- and flake-like nanostructures, and SnO_2 films have grape-like structures with nanograins. The resistivity values for the SnO_2 phase were found to be as low as 10^{-5} Ω cm and were observed to decrease with increasing substrate temperature.
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326-329
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published
2013-02
Contributors
author
- Sakarya University, Dept. of Metallurgical & Materials Engineering, 54187, Sakarya, Turkey
author
- Sakarya University, Dept. of Metallurgical & Materials Engineering, 54187, Sakarya, Turkey
author
- Sakarya University, Dept. of Metallurgical & Materials Engineering, 54187, Sakarya, Turkey
author
- Sakarya University, Dept. of Metallurgical & Materials Engineering, 54187, Sakarya, Turkey
References
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Document Type
Publication order reference
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bwmeta1.element.bwnjournal-article-appv123n2057kz