Influence of Thermal Oxidation Temperatures on the Structural and Morphological Properties of MoO_3 Thin Films

• Authors: A. Hojabri , F. Hajakbari , A. Emami Meibodi , M. Moghri Moazzen
• Languages of publication: EN

Abstracts

EN

In this study, molybdenum (Mo) thin films have been deposited on Si substrate by dc magnetron sputtering. Then for preparation of MoO_3 thin films the thermal oxidation of Mo thin films under the oxygen flow was employed in the electrical furnace. The influence of the different thermal oxidation temperatures at 400, 600, 800 and 1000C on the structural and morphological properties of MoO_3 thin films were characterized by X-ray diffraction and atomic force microscopy, respectively. The results show that the crystallinity and surface morphology of the films are strongly dependent on the thermal oxidation temperatures.

Keywords

EN

61.05.cp; 68.37.Ps; 68.55.J-; 65.40.-b

Discipline

• 65.40.-b: Thermal properties of crystalline solids
• 61.05.cp: X-ray diffraction
• 68.37.Ps: Atomic force microscopy (AFM)
• 68.55.J-: Morphology of films

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2013
• Volume: 123
• Issue: 2
• Pages: 307-308

Dates

published

2013-02

Contributors

author

A. Hojabri

• Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran

author

F. Hajakbari

• Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran

author

A. Emami Meibodi

• Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran

author

M. Moghri Moazzen

• Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran

References

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• [7] B.D. Cullity, Elements of X-ray Diffractions, Addison-Wesley, Reading MA 1978, p. 102

Identifiers

DOI

10.12693/APhysPolA.123.307