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2013 | 123 | 2 | 307-308
Article title

Influence of Thermal Oxidation Temperatures on the Structural and Morphological Properties of MoO_3 Thin Films

Content
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Languages of publication
EN
Abstracts
EN
In this study, molybdenum (Mo) thin films have been deposited on Si substrate by dc magnetron sputtering. Then for preparation of MoO_3 thin films the thermal oxidation of Mo thin films under the oxygen flow was employed in the electrical furnace. The influence of the different thermal oxidation temperatures at 400, 600, 800 and 1000C on the structural and morphological properties of MoO_3 thin films were characterized by X-ray diffraction and atomic force microscopy, respectively. The results show that the crystallinity and surface morphology of the films are strongly dependent on the thermal oxidation temperatures.
Keywords
Year
Volume
123
Issue
2
Pages
307-308
Physical description
Dates
published
2013-02
References
  • [1] N. Miyata, S. Akiyoshi, J. Appl. Phys. 58, 1651 (1985)
  • [2] E. Fortunato, D. Ginley, H. Hosono, D.C. Paine, MRS Bull. 32, 242 (2007)
  • [3] D. Manno, M.D. Giulio, A. Serra, T. Siciliano, G. Micocci, J. Phys. D, Appl. Phys. 35, 228 (2002)
  • [4] C.A. Ellefson, O. Marin-Flores, Su Ha, M. Grant Norton, J. Mater. Sci. 47, 2057 (2012)
  • [5] T. Aoki, T. Matsushita, K. Mishiro, A. Suzuki, M. Okuda, Thin Solid Films 517, 1482 (2008)
  • [6] H. Ohtsuka, Y. Sakurai, Solid State Ion. 144, 59 (2001)
  • [7] B.D. Cullity, Elements of X-ray Diffractions, Addison-Wesley, Reading MA 1978, p. 102
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv123n2050kz
Identifiers
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