Characterization of Nitride Thin Films Using SEM and EDX

• Authors: F. Mammeri , L. Chekour , N. Rouag
• Languages of publication: EN

Abstracts

EN

The chromium nitride thin films have became more and more popular in the last years because of their very good physical, chemical and mechanical properties. The present study relates to thermal stability of hard thin films of chromium nitride CrN, carried out physical vapour deposition. We studied the influence of the annealing temperature on the morphology of CrN films, deposited on silicon substrate using magnetron sputtering. The characterizations are examined using scanning electron microscope equipped with energy dispersive X-ray spectroscopy. Annealing treatments in N_2 at 600-1000C for 1 h are performed on CrN coating samples for 530 nm thickness. At low temperature, the results show a thermal stability of these coatings. The Cr_2O_3 phase is completely replaced by the CrN phase at temperature above 1000°C. The results given by scanning electron microscopy-energy dispersive X-ray spectroscopy and X-ray diffraction are compared.

Keywords

EN

67.25.dp; 68.55.J-; 81.15.-z; 68.37.Hk; 68.90.+g

Discipline

• 68.37.Hk: Scanning electron microscopy (SEM) (including EBIC)
• 67.25.dp: Films
• 68.55.J-: Morphology of films
• 68.90.+g: Other topics in structure, and nonelectronic properties of surfaces and interfaces; thin films and low-dimensional structures (restricted to new topics in section 68)
• 81.15.-z: Methods of deposition of films and coatings; film growth and epitaxy(for structure of thin films, see 68.55.-a; see also 85.40.Sz Deposition technology in microelectronics; for epitaxial dielectric films, see 77.55.Px)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2013
• Volume: 123
• Issue: 2
• Pages: 294-295

Dates

published

2013-02

Contributors

author

F. Mammeri

• Laboratoire Microstructure et Défauts dans les Matériaux, Université Mentouri Constantine, Algeria

author

L. Chekour

• Laboratoire Microstructure et Défauts dans les Matériaux, Université Mentouri Constantine, Algeria

author

N. Rouag

• Laboratoire Microstructure et Défauts dans les Matériaux, Université Mentouri Constantine, Algeria

References

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Identifiers

DOI

10.12693/APhysPolA.123.294