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2013 | 123 | 1 | 76-79
Article title

Characterization of TiAlV Films Prepared by Vacuum Arc Deposition: Effect of Substrate Temperature

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EN
Abstracts
EN
Three TiAlV films have been prepared by vacuum arc discharge technique at different substrate temperatures (50, 300, and 400°C). The depositions were carried out from aluminum, vanadium and titanium elemental targets. The temperature effects on the crystalline quality and texture have been investigated by means of X-ray diffraction. Two phases have been identified and the grain size has been found to increase with temperature. The composition of the films has been determined by proton induced X-ray emission technique. The Ti ratio was found to increase with temperature. The microhardness, measured by the Vickers indentation method was found to decrease with temperature. X-ray photoelectron spectroscopy was used to study the chemical composition of the passive layer formed on the films by analyzing high resolution spectra of Al 2p, Ti 2p and V 2p. This layer was mainly composed of TiO_2 with a small participation of other oxidation and metallic states of Ti, Al and V.
Keywords
EN
Publisher

Year
Volume
123
Issue
1
Pages
76-79
Physical description
Dates
published
2013-01
received
2011-10-13
(unknown)
2012-10-14
Contributors
author
  • Atomic Energy Commission, Department of Physics, P.O. Box 6091, Damascus, Syria
author
  • Atomic Energy Commission, Department of Chemistry, P.O. Box 6091, Damascus, Syria
author
  • Atomic Energy Commission, Department of Chemistry, P.O. Box 6091, Damascus, Syria
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv123n117kz
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