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2013 | 123 | 1 | 67-72
Article title

Study on the Breakdown Mechanism of Fabrication of Micro Channels in Fused Silica Substrates with ps Laser Pulses

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EN
Abstracts
EN
A new microchannel fabrication technology for fused silica substrate is presented. A mode-locked laser was used to fabricate straight microchannels in a fused silica substrate by laser plasma-induced plasma. The depth of the channels is up to 5 mm and there are no thermal cracks around the channel. We studied the ionization mechanism of optical breakdown formed by laser pulses and discussed the optical breakdown threshold. A mechanism is proposed to explain the formation of the microchannels and the characteristics of the microchannels are analyzed through the laser pulse characteristics.
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Contributors
author
  • School of Physics and Electronic Science, Guizhou Normal College, China
author
  • Key Lab of Photoelectron Technology and Application, University of Guizhou, China
author
  • Key Lab of Photoelectron Technology and Application, University of Guizhou, China
References
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bwmeta1.element.bwnjournal-article-appv123n115kz
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