Study on the Breakdown Mechanism of Fabrication of Micro Channels in Fused Silica Substrates with ps Laser Pulses

• Authors: S. Li , Z. Bai , S. Qin
• Languages of publication: EN

Abstracts

EN

A new microchannel fabrication technology for fused silica substrate is presented. A mode-locked laser was used to fabricate straight microchannels in a fused silica substrate by laser plasma-induced plasma. The depth of the channels is up to 5 mm and there are no thermal cracks around the channel. We studied the ionization mechanism of optical breakdown formed by laser pulses and discussed the optical breakdown threshold. A mechanism is proposed to explain the formation of the microchannels and the characteristics of the microchannels are analyzed through the laser pulse characteristics.

Keywords

EN

52.50.Jm; 52.40.Hf; 61.80.-x; 42.62.-b

Discipline

• 42.62.-b: Laser applications
• 52.40.Hf: Plasma-material interactions; boundary layer effects
• 52.50.Jm: Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
• 61.80.-x: Physical radiation effects, radiation damage(for photochemical reactions, see 82.50.-m; for effects of ionizing radiation on biological systems, see 87.53.-j)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2013
• Volume: 123
• Issue: 1
• Pages: 67-72

Dates

published

2013-01

received

2011-11-04

(unknown)

2012-09-29

Contributors

author

S. Li

• School of Physics and Electronic Science, Guizhou Normal College, China

author

Z. Bai

• Key Lab of Photoelectron Technology and Application, University of Guizhou, China

author

S. Qin

• Key Lab of Photoelectron Technology and Application, University of Guizhou, China

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Identifiers

DOI

10.12693/APhysPolA.123.67