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2012 | 122 | 1 | 230-235
Article title

Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

Content
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EN
Abstracts
EN
Dual-frequency plasma enhanced chemical vapor deposition was used to grow diamond-like carbon thin films from CH_4, H_2 gas mixture. The effects of radio frequency, microwave power, and gas ratio were investigated. Various species have been identified in the CH_4-H_2 plasma using optical emission spectroscopy and their effects on film properties have been studied. Increasing the RF power to 400 W, the variation trend of refractive index and CH, C_2 intensity ratios change beyond the 300 W, but the growth rate shows the continuous increasing character from 6 to 11.6 nm/min. Increasing the hydrogen content in the system, the intensity ratio of CH, C_2, CH^{+} and growth rate show decreasing tendency and the refractive index rises from 1.98 to 2.63. Adding MW produced plasma to the system grows the refractive index to 2.88 and growth rate to 10.8 nm/min. The water contact angle rises from 58.95° to 73.74° as the RF power increases to 300 W but begins to reduce until 400 W. In addition, the contact angle shows a growing tendency by increasing the hydrogen flow to the chamber. In addition, the structures of the films were investigated by the Raman spectroscopy.
Keywords
EN
Publisher

Year
Volume
122
Issue
1
Pages
230-235
Physical description
Dates
published
2012-07
received
2011-08-21
(unknown)
2012-03-18
Contributors
author
  • Islamic Azad University, South Tehran Branch, Tehran, Iran
author
  • Laser and Plasma Research Institute, Shahid Beheshti University, G.C., Evin, Tehran, Iran
  • Faculty of Science, University of Aeronautical Science and Technology, Tehran, Iran
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv122n1p46kz
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