Characteristics of the 2nd Harmonic ECR Micro Plasma Sources by Using PIC/MCC Simulations

• Authors: M. Radmilović-Radjenović , B. Radjenović , P. Beličev
• Languages of publication: EN

Abstracts

EN

In this paper we have presented our simulation studies of 2.4 GHz microwave plasma production under the electron cyclotron resonance with an idea to expand the plasma generation conditions into the much lower pressure range and much shorter gap length. As the first for this purpose, we have focused on the influences of applied magnetic field, gas pressure and gap length on the breakdown and maintenance of plasmas. Calculations were performed by using a one-dimensional particle-in-cell/Monte Carlo collisions code with three velocity components. The obtained simulation results are in a good agreement with the available experimental data providing an insight into the resonant electron acceleration for ECR condition and the resonant electron confinement for the 2nd harmonic ECR. In addition, analytical expressions for the breakdown voltage and the trapping field have been derived.

Keywords

EN

52.25.Os; 52.65.-y

Discipline

• 52.25.Os: Emission, absorption, and scattering of electromagnetic radiation
• 52.65.-y: Plasma simulation

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2012
• Volume: 122
• Issue: 1
• Pages: 128-131

Dates

published

2012-07

received

2012-01-11

(unknown)

2012-03-09

Contributors

author

M. Radmilović-Radjenović

• Institute of Physics, University of Belgrade, Pregrevica 118, 11080 Belgrade, Serbia

author

B. Radjenović

• Institute of Physics, University of Belgrade, Pregrevica 118, 11080 Belgrade, Serbia

author

P. Beličev

• Vinča Institute of Nuclear Science, University of Belgrade, 11001 Belgrade, Serbia

References

• 1. M. Matsushita, Y. Matsuda, H. Fujiyama, Thin Solid Films 435, 285 (2003)
• 2. T. Ito, K. Terashima, Appl. Phys. Lett. 80, 2854 (2002)
• 3. M. Kumamoto, H. Inoue, M. Matsushita, H. Fujiyama, Thin Solid Films 475, 124 (2005)
• 4. T. Shigemizu, N. Ohno, K. Fujiyama, Mater. Sci. Eng. A 139, 312 (1991)
• 5. B. Lax, W.P. Allis, S.C. Brown, J. Appl. Phys. 21, 1297 (1950)
• 6. Y. Hayashi, T. Kato, S. Takeda, Trans. IEEE Jpn. A 105, 605 (1985)
• 7. M.A. Hussein, G.A. Emmert, N. Hershkowitz, R.C. Woods, J. Appl. Phys. 72, 1720 (1992)
• 8. N.H. Choi, W.H. Koh, N.S. Yoon, H.B. Pard, D.I. Choi, IEEE Trans. Plasma Sci. 23, 617 (1995)
• 9. X.X. Zhong, J.D. Wu, C.Z. Wu, F.M. Li, J. Appl. Phys. 83, 5069 (1998)
• 10. C.K. Birdsall, IEEE Trans. Plasma Sci. 19, 65 (1991)
• 11. M. Radmilović-Radjenović, B. Radjenović, Plasma Sources Sci. Technol. 16, 337 (2007)

Identifiers

DOI

10.12693/APhysPolA.122.128