Micropatterning of Silicon Surface by Direct Laser Interference Lithography

• Authors: M. Lorens , Y. Zabila , M. Krupiński , M. Perzanowski , K. Suchanek , K. Marszałek , M. Marszałek
• Languages of publication: EN

Abstracts

EN

Direct laser interference lithography is a new and low cost technique which can generate the line- or dot-like periodic patterns over large areas. In the present work, we report on direct fabrication of micrometer structures on Si surface. In the experiments the pulsed high power Nd:YAG laser operating at 1064 nm wavelength was used. Two-beam configuration with an angle of incidence of 40° was employed and different laser fluences up to 2.11 J/cm^2 were tested. Areas about 1 cm in diameter have been processed with a single pulse of 10 ns. The laser treated samples were analyzed by atomic force microscopy to investigate the surface topography and to measure the size and depth of the achieved structures. We observed periodic line-like arrays with grating period of the order of 1 μm.

Keywords

EN

68.55.-a; 81.16.-c; 81.65.Cf

Discipline

• 81.16.-c: Methods of micro- and nanofabrication and processing(for femtosecond probing of semiconductor nanostructures, see 82.53.Mj in physical chemistry and chemical physics)
• 81.65.Cf: Surface cleaning, etching, patterning(see also 52.77.Bn Etching and cleaning in physics of plasmas)
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2012
• Volume: 121
• Issue: 2
• Pages: 543-545

Dates

published

2012-02

Contributors

author

M. Lorens

• Faculty of Physics and Applied Computer Science, AGH University of Science and Technology, Kraków, Poland

author

Y. Zabila

• The Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences, Kraków, Poland

author

M. Krupiński

• The Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences, Kraków, Poland

author

M. Perzanowski

• The Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences, Kraków, Poland

author

K. Suchanek

• The Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences, Kraków, Poland

author

K. Marszałek

• Faculty of Physics and Applied Computer Science, AGH University of Science and Technology, Kraków, Poland

author

M. Marszałek

• The Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences, Kraków, Poland

References

• [1] A. Aktag, S. Michalski, L. Yue, R.D. Kirby, S.-H. Liou, J. Appl. Phys. 99, 093901 (2006)
• [2] C. Schuppler, A. Habencht, I.L. Guhr, Appl. Phys. Lett. 88, 012506 (2006)
• [3] Y. Cheng, A. Pepin, Electrophoresis 22, 187 (2001)
• [4] A. Lasagni, C. Holzapfel, T. Weirich, F. Mucklich, Appl. Surf. Sci. 253, 8070 (2007)
• [5] A. Lasagni, F. Mucklich, J. Mater. Proc. Technol. 209, 202 (2009)
• [6] Y. Zabila, M. Perzanowski, A. Dobrowolska, M. Kąc, A. Polit, M. Marszałek, Acta Phys. Pol. A 115, 591 (2009)
• [7] S. Riedel, M. Schmotz, P. Leiderer, J. Boneberg, Appl. Phys. A 101, 309 (2010)
• [8] M. Ellman, A. Rodriguez, N. Perez, M. Echeverrira, Y.K. Verevkin, C.S. Peng, T. Berthou, Z. Wang, S.M. Olaizola, I. Ayerdi, Appl. Surf. Sci. 255, 5537 (2009)
• [9] M. Thompson, J. Mayer, A.G. Cullis, H.C. Webber, N.G. Chew, J.M. Poate, D.C. Jacobson, Phys. Rev. Lett. 50, 896 (1983)
• [10] J.A. Yater, M.O. Thompson, Phys. Rev. Lett. 63, 2088 (1989)

Identifiers

DOI

10.12693/APhysPolA.121.543