EUV-Induced Nanostructuring of Solids

• Authors: A. Bartnik , H. Fiedorowicz , R. Jarocki , J. Kostecki , A. Szczurek , M. Szczurek , P. Wachulak
• Languages of publication: EN

Abstracts

EN

In this work results of investigations concerning nanostructuring of polymers and some other solids using a laser-plasma extreme ultraviolet source are presented. The plasma radiation was produced using a gas puff target and focused with a gold-plated grazing incidence ellipsoidal collector. Decomposition process of polymers was investigated using a quadrupole mass spectrometer. Different kinds of micro- and nanostructures created in near-surface layers of the materials were investigated using scanning electron microscope. Forms of the structures depend on a particular material and the extreme ultraviolet exposure. In case of some polymers even a single shot is sufficient for creation of the visible changes in surface morphology. In case of inorganic solids visible changes require usually the exposure with tens or hundreds of extreme ultraviolet pulses.

Keywords

EN

52.38.Ph; 82.50.Kx; 81.40.Wx

Discipline

• 82.50.Kx: Processes caused by X-rays or γ-rays
• 81.40.Wx: Radiation treatment (particle and electromagnetic)(see also 61.80.-x Physical radiation effects, radiation damage)
• 52.38.Ph: X-ray, γ-ray, and particle generation

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2012
• Volume: 121
• Issue: 2
• Pages: 445-449

Dates

published

2012-02

Contributors

author

A. Bartnik

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

H. Fiedorowicz

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

R. Jarocki

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

J. Kostecki

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

A. Szczurek

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

M. Szczurek

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

author

P. Wachulak

• Institute of Optoelectronics, Military University of Technology, S. Kaliskiego 2, 00-908 Warsaw, Poland

References

• [1] N.S. Murthy, R.D. Prabhu, J.J. Martin, L. Zhou, R.L. Headrick, J. Appl. Phys. 100, 023538 (2006)
• [2] T. Lippert, Adv. Polym. Sci. 168, 51 (2004)
• [3] S. Lazare, R. Srinivasan, J. Phys. Chem. 90, 2124 (1986)
• [4] B. Hopp, Zs. Bor, E. Homolya, E. Mihalik, Appl. Surf. Sci. 109/110, 232 (1997)
• [5] V. Oliveira, R. Vilar, Appl. Phys. A 92, 957 (2008)
• [6] N. Bityurin, E. Arenholz, N. Arnold, D. Bäuerle, Phys. Rev. E 75, 041603 (2007)
• [7] E. Arenholz, V. Svorcik, T. Kefer, J. Heitz, D. Bauerle, Appl. Phys. A 53, 330 (1991)
• [8] T. Peterbauer, S. Yakunin, J. Siegel, S. Hering, M. Fahrner, C. Romanin, J. Heitz, J. Nanomater. 2011, 413079 (2010)
• [9] E. Rebollar, I. Frischauf, M. Olbrich, T. Peterbauer, S. Hering, J. Preiner, P. Hinterdorfer, C. Romanin, J. Heitz, Biomaterials 29, 1796 (2008)
• [10] Y. Wan, Y. Wang, Z. Liu, X. Qu, B. Han, J. Bei, S. Wang, Biomaterials 26, 4453 (2005)
• [11] E.K.F. Yim, R.M. Reano, S.W. Pang, A.F. Yee, C.S. Chen, K.W. Leong, Biomaterials 26, 5405 (2005)
• [12] http://www-cxro.lbl.gov/
• [13] A. Bartnik, H. Fiedorowicz, R. Jarocki, J. Kostecki, A. Szczurek, M. Szczurek, Appl. Phys. B 96, 727 (2009)
• [14] A. Bartnik, H. Fiedorowicz, R. Jarocki, J. Kostecki, M. Szczurek, A. Biliński, O. Chernyayeva, J.W. Sobczak, Appl. Phys. A 99, 831 (2010)
• [15] J. Heitz, E. Arenholz, D. Bauerle, R. Sauerbrey, H.M. Phillips, Appl. Phys. A 59, 289 (1994)
• [16] Y. Zhang, T. Katoh, M. Washio, H. Yamada, S. Hamada, Appl. Phys. Lett. 67, 872 (1995)
• [17] T. Katoh, D. Yamaguchi, Y. Satoh, S. Ikeda, Y. Aoki, M. Washio, Y. Tabata, Appl. Surf. Sci. 186, 24 (2002)
• [18] A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek, Microelectron. Eng. 78-79, 452 (2005)
• [19] A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek, Appl. Phys. B 82, 529 (2006)

Identifiers

DOI

10.12693/APhysPolA.121.445