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2012 | 121 | 2 | 385-387
Article title

Pulsed Laser Interference Patterning of Metallic Thin Films

Content
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Languages of publication
EN
Abstracts
EN
Pulsed laser interference is applied to metallic and semiconductor thin films in the thickness range of 40-100 nm. At intensities which induce local melting we observe local retraction of the molten material towards the unmolten areas due to dewetting. Thus micropatterning of surface gets feasible. Although this dewetting induced retraction should be a common behaviour of metals on oxide surfaces, two groups of materials can be distinguished. In the first group the former molten areas get completely blank of metal while in the second group a material droplet remains in the center of the molten area. We show that this behaviour can be attributed to a distinctly different way of liquid movement upon local melting.
Keywords
EN
Year
Volume
121
Issue
2
Pages
385-387
Physical description
Dates
published
2012-02
References
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Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv121n251kz
Identifiers
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