Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films

• Authors: S. Çörekçí , K. Kızılkaya , T. Asar , M. Öztürk , M. Çakmak , S. Özçelík
• Languages of publication: EN

Abstracts

EN

Titanium dioxide (TiO_2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000C in steps of 200°C. The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by X-ray diffraction and atomic force microscopy measurements. It was found that the film quality and morphology depend on the annealing temperature. TiO_2 films exhibit a grain-like surface morphology. The root-mean-square roughness and grain size on the surface increase as a result of increasing film thickness.

Keywords

EN

68.55.J-; 61.05.cp; 68.37.Ps

Discipline

• 61.05.cp: X-ray diffraction
• 68.37.Ps: Atomic force microscopy (AFM)
• 68.55.J-: Morphology of films

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2012
• Volume: 121
• Issue: 1
• Pages: 247-248

Dates

published

2012-01

Contributors

author

S. Çörekçí

• Department of Physics, Kirklareli University, 39160 Kırklareli, Turkey

author

K. Kızılkaya

• Department of Physics, Gazi University, 06500 Ankara, Turkey

author

T. Asar

• Department of Physics, Gazi University, 06500 Ankara, Turkey

author

M. Öztürk

• Department of Physics, Gazi University, 06500 Ankara, Turkey

author

M. Çakmak

• Department of Physics, Gazi University, 06500 Ankara, Turkey

author

S. Özçelík

• Department of Physics, Gazi University, 06500 Ankara, Turkey

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Identifiers

DOI

10.12693/APhysPolA.121.247