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2012 | 121 | 1 | 247-248
Article title

Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films

Content
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Languages of publication
EN
Abstracts
EN
Titanium dioxide (TiO_2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000C in steps of 200°C. The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by X-ray diffraction and atomic force microscopy measurements. It was found that the film quality and morphology depend on the annealing temperature. TiO_2 films exhibit a grain-like surface morphology. The root-mean-square roughness and grain size on the surface increase as a result of increasing film thickness.
Keywords
EN
Publisher

Year
Volume
121
Issue
1
Pages
247-248
Physical description
Dates
published
2012-01
Contributors
  • Department of Physics, Kirklareli University, 39160 Kırklareli, Turkey
  • Department of Physics, Gazi University, 06500 Ankara, Turkey
author
  • Department of Physics, Gazi University, 06500 Ankara, Turkey
author
  • Department of Physics, Gazi University, 06500 Ankara, Turkey
author
  • Department of Physics, Gazi University, 06500 Ankara, Turkey
author
  • Department of Physics, Gazi University, 06500 Ankara, Turkey
References
  • 1. A. Fujishima, K. Honda, Nature 238, 37 (1972)
  • 2. T. Ihara, M. Miyoshi, M. Ando, S. Sugihara, Y. Iriyama, J. Mater. Sci. 36, 4201 (2001)
  • 3. M. Anpo, M. Takeuchi, J. Catal. 216, 505 (2003)
  • 4. N.R. Mathews, E.R. Morales, M.A. Cortes-Jacome, J.A.T. Antonio, Sol. Energy 83, 1499 (2009)
  • 5. K. Zakrzewska, M. Radecka, M. Rekas, Thin Solid Films 310, 161 (1997)
  • 6. Z. Seeley, Y.J. Choi, S. Bose, Sensors Actuators B 140, 98 (2009)
  • 7. O'Regan, M. Gratzel, Nature 353, 737 (1991)
  • 8. F. Li, Y. Gu, Mater. Sci. Semicond. Proc., in press, doi:10.1016/j.mssp.2011.04.008
  • 9. D. Yoo, I. Kim, S. Kim, C.H. Hahn, C. Le, S. Cho, Appl. Surf. Sci. 253, 3888 (2007)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv121n176kz
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