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2012 | 121 | 1 | 175-177
Article title

Study of Silicon Nanocrystals Formation in Annealed Amorphous In Situ Nitrogen Doped Silicon Thin Films Obtained by Low Pressure Chemical Vapor Deposition

Content
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Languages of publication
EN
Abstracts
EN
In this work, we investigate the formation of silicon nanocrystals in annealed low pressure chemical vapor deposition in situ nitrogen doped silicon thin films (SiN_x) obtained at low temperature (465°C) by using a mixture of disilane (Si_2H_6) and ammonia (NH_3). Results show that nitrogen content in films plays an important role in defining the obtained films morphology in terms of crystallites sizes and their distribution. Indeed, according to the nitrogen content introduced in films, the crystalline state of films varies from a submicron crystalline structure to a nanocrystalline structure. An average silicon nanocrystalline size of 10 nm was obtained for film with x = 0.07 nitrogen content, annealed under a temperature of 850C during 2 h.
Keywords
Publisher

Year
Volume
121
Issue
1
Pages
175-177
Physical description
Dates
published
2012-01
Contributors
author
  • Département d'Electronique, Université de Jijel, B.P. 98, Ouled Aissa, Jijel 18000, Algeria
author
  • Département d'Electronique, Université de Jijel, B.P. 98, Ouled Aissa, Jijel 18000, Algeria
author
  • Département d'Electronique, Université de Jijel, B.P. 98, Ouled Aissa, Jijel 18000, Algeria
author
  • Département d'Electronique, Université Mentouri, Route d'Ain El-Bey, Constantine 25000, Algeria
author
  • Département d'Electronique, Université de Jijel, B.P. 98, Ouled Aissa, Jijel 18000, Algeria
  • CNRS, LAAS, 7 av. du colonel Roche, F-31077 Toulouse, France
  • UPS, INSA, INP, ISAE, LAAS, Université de Toulouse, F-31077 Toulouse, France
References
  • 1. I.Y.Y. Bu, A.J. Flewitt, W.I. Milne, Curr. Appl. Phys. 11, 171 (2011)
  • 2. N. Dandosso, G. Das, S. Larcheri, G. Mariotto, G. Dalba, L. Pavesi, A. Irrera, F. Priolo, F. Lacona, F. Rocca, J. Appl. Phys. 101, 113510 (2007)
  • 3. A.M. Funde, N.A. Bakr, D.K. Kamble, R.R. Hawaldar, D.P. Amalnerkar, S.R. Jadkar, Solar Energy Mater. Solar Cells 92, 1217 (2008)
  • 4. S. Kohli, J.A. Theil, P.C. Dippo, K.M. Jones, M.M. Al-Jassim, R.K. Ahrenkiel, C.D. Rithner, P.K. Dorhout, Nanotechnology 15, 1831 (2004)
  • 5. P. Temple-Boyer, B. Rousset, E. Scheid, Thin Solid Films 518, 6897 (2010)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv121n153kz
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