Effect of the Plasma Deposition Parameters on the Properties of Ti/TiC Multilayers for Hard Coatings Applications

• Authors: N. Saoula , K. Henda , R. Kesri , S. Shrivastava , R. Erasmus , J. Comins
• Languages of publication: EN

Abstracts

EN

Titanium carbide (TiC) hard coatings have been obtained on steel and silicon substrates by rf magnetron sputtering process. Two layer coatings have been deposited in order to improve adhesion on steel. The lower layer was titanium metal and the upper TiC layer was obtained by reactive sputtering of the titanium target in Ar and methane gas mixture. The study confirmed that the TiC layer composition depends on the reactive sputtering gas composition and substrate bias voltage. Film microhardness was measured by microindentation. Measurement results showed that the hardness coating depends on the microstructure of our coatings and the polarization of bias substrate is an important parameter to control the microstructure.

Keywords

EN

81.15.Cd; 68.35.Ct; 68.55.-a; 68.37.Ps

Discipline

• 68.35.Ct: Interface structure and roughness
• 68.37.Ps: Atomic force microscopy (AFM)
• 81.15.Cd: Deposition by sputtering
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2012
• Volume: 121
• Issue: 1
• Pages: 172-174

Dates

published

2012-01

Contributors

author

N. Saoula

• Plasma Discharges Group, DMIL, CDTA, P.O. Box 17, Baba hassen, Algiers, Algeria

author

K. Henda

• Plasma Discharges Group, DMIL, CDTA, P.O. Box 17, Baba hassen, Algiers, Algeria

author

R. Kesri

• LECTCM, USTHB, P.O. Box 32, El Alia, BabEzzouar, Algiers, Algeria

author

S. Shrivastava

• Department of Physics, University of the Witwatersrand, Johannesburg, Wits2050, South Africa

author

R. Erasmus

• Department of Physics, University of the Witwatersrand, Johannesburg, Wits2050, South Africa

author

J. Comins

• Department of Physics, University of the Witwatersrand, Johannesburg, Wits2050, South Africa

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Identifiers

DOI

10.12693/APhysPolA.121.172