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Abstracts
Titanium carbide (TiC) hard coatings have been obtained on steel and silicon substrates by rf magnetron sputtering process. Two layer coatings have been deposited in order to improve adhesion on steel. The lower layer was titanium metal and the upper TiC layer was obtained by reactive sputtering of the titanium target in Ar and methane gas mixture. The study confirmed that the TiC layer composition depends on the reactive sputtering gas composition and substrate bias voltage. Film microhardness was measured by microindentation. Measurement results showed that the hardness coating depends on the microstructure of our coatings and the polarization of bias substrate is an important parameter to control the microstructure.
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Journal
Year
Volume
Issue
Pages
172-174
Physical description
Dates
published
2012-01
Contributors
author
- Plasma Discharges Group, DMIL, CDTA, P.O. Box 17, Baba hassen, Algiers, Algeria
author
- Plasma Discharges Group, DMIL, CDTA, P.O. Box 17, Baba hassen, Algiers, Algeria
author
- LECTCM, USTHB, P.O. Box 32, El Alia, BabEzzouar, Algiers, Algeria
author
- Department of Physics, University of the Witwatersrand, Johannesburg, Wits2050, South Africa
author
- Department of Physics, University of the Witwatersrand, Johannesburg, Wits2050, South Africa
author
- Department of Physics, University of the Witwatersrand, Johannesburg, Wits2050, South Africa
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv121n152kz