Fabrication of Antireflection Structures as a Protective Layer of Solar Cells with Nanoporous Silica Films and Nanoimprinted Moth-Eye Structure

• Authors: K. Kim , J. Han , J. Jang , C. Choi , S. Choi , C. Kim , H. Kye , I. Cheong
• Languages of publication: EN

Abstracts

EN

The antireflection structures are fabricated by sol-gel process as a protective layer of solar cells and by hot embossing process with anodized aluminum oxide membrane template on polycarbonate film. The optical properties and morphology of the antireflection structures are analyzed by UV-visible spectroscopy and field emission scanning electron microscopy, respectively. The total conversion efficiency of a polycrystalline Si solar cell module with the protective layer, sol-gel-derived nanoporous antireflection structure, is increased by 2.6% and 5.7% for one-side antireflection coated prismatic matt glass and both-side antireflection coated prismatic matt glass, respectively.

Keywords

EN

61.46.-w; 68.37.-d; 68.55.-a; 78.20.-e

Discipline

• 68.37.-d: Microscopy of surfaces, interfaces, and thin films
• 78.20.-e: Optical properties of bulk materials and thin films(for optical properties related to materials treatment, see 81.40.Tv; for optical materials, see 42.70-a; for optical properties of superconductors, see 74.25.Gz; for optical properties of rocks and minerals, see 91.60.Mk; for optical properties of specific thin films, see 78.66.-w)
• 61.46.-w: Structure of nanoscale materials(for thermal properties of nanocrystals and nanotubes, see 65.80.-g; for mechanical properties of nanoscale systems, see 62.25.-g; for electronic transport in nanoscale materials, see 73.63.-b; see also 62.23.-c Structural classes of nanoscale systems; 64.70.Nd Structural transitions in nanoscale materials; for magnetic properties of nanostructures, see 75.75.-c)
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Journal: Acta Physica Polonica A
• Year: 2011
• Volume: 120
• Issue: 6A
• Pages: A-47-A-49

Dates

published

2011-12

Contributors

author

K. Kim

• Department of Material Design Engineering, Mokwon University, 21 Mokwon-gil, Seo-gu, Daejeon, 302-729, Korea
• Creative Research Center for Graphene Electronics, ETRI, 218 Gajeong-ro, Yuseong-gu, Daejeon, 305-700, Korea

author

J. Han

• Creative Research Center for Graphene Electronics, ETRI, 218 Gajeong-ro, Yuseong-gu, Daejeon, 305-700, Korea

author

J. Jang

• HYTC, 702 Tamnip-dong, Yuseong-gu, Daejeon, 305-510, Korea

author

C. Choi

• Creative Research Center for Graphene Electronics, ETRI, 218 Gajeong-ro, Yuseong-gu, Daejeon, 305-700, Korea

author

S. Choi

• Creative Research Center for Graphene Electronics, ETRI, 218 Gajeong-ro, Yuseong-gu, Daejeon, 305-700, Korea

author

C. Kim

• Department of Material Design Engineering, Mokwon University, 21 Mokwon-gil, Seo-gu, Daejeon, 302-729, Korea

author

H. Kye

• Department of Material Design Engineering, Mokwon University, 21 Mokwon-gil, Seo-gu, Daejeon, 302-729, Korea

author

I. Cheong

• Department of Material Design Engineering, Mokwon University, 21 Mokwon-gil, Seo-gu, Daejeon, 302-729, Korea

References

• [1] Q. Liu, J. Zhang, Q. Liu, Z. Zhu, J. Chen, Mater. Chem. Phys. 114, 309 (2009)
• [2] Ö. Kesmez, H. Erdem Çamurlu, E. Burunkaya, E. Arpaç, Solar Energy Mater. Solar Cells 93, 1833 (2009)
• [3] G. Wu, J. Wang, J. Shen, T. Yang, Q. Zhang, B. Zhou, Z. Deng, B. Fan, D. Zhou, F. Zhang, Mater. Res. Bull. 36, 2127 (2001)
• [4] N. Yamada, O. Kim, T. Tokimitsu, Y. Nakai, H. Masuda, Prog. Photovolt. Res. Appl. 13, 134 (2011)
• [5] K. Han, H. Lee, D. Kim, H. Lee, Solar Energy Mater. Solar Cells 93, 1214 (2009)
• [6] K. Choi, S. Park, Y. Song, Y. Lee, C. Hwangbo, H. Yang, H. Lee, Adv. Mater. 22, 3713 (2010)

Identifiers

DOI

10.12693/APhysPolA.120.A-47