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2011 | 120 | 6A | A-37-A-39
Article title

Substrate Temperature Influenced Structural and Electrical Behaviour of~RF Magnetron Sputtered Ag_2Cu_2O_3 Films

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EN
Abstracts
EN
Ag_2Cu_2O_3 films were deposited on glass and silicon substrates by RF magnetron sputtering of metallic equimolar (Ag_{50}Cu_{50}) alloy target in Ar-O_{2} mixture at different substrate temperature (T_{s}) ranging between 303 and 523 K. The effect of T_{s} on the core level binding energies, structural and electrical properties of the films was systematically studied. The films deposited at room temperature were amorphous. The films deposited at 373 K were polycrystalline and the crystallinity was increased when the T_{s} was increased to 423 K. The films deposited at 423 K and subsequently annealed at 498 K exhibits single phase Ag_2Cu_2O_3. In the case of films deposited at higher T_{s} of 523 K, Ag_2O was decomposed into Ag. The electrical resistivity of the films deposited at 303 K was 1.2 × 10^{-5} Ω cm, whereas the films formed at 423 K and subsequently annealed at 498 K showed electrical resistivity of 2.2 × 10^{-3} Ω cm due to improvement in the crystallinity of single phase Ag_2Cu_2O_3.
Keywords
Year
Volume
120
Issue
6A
Pages
A-37-A-39
Physical description
Dates
published
2011-12
References
  • [1] P. Gomez-Romero, E.M. Tejada-Rosales, M. Rosa-Palacin, Angew. Chem. Int. Ed. 38, 524 (1999)
  • [2] D. Munoz-Rojas, J. Fraxedas, P. Gomez-Romero, N. Casan-Pastor, J. Solid State Chem. 178, 295 (2005)
  • [3] D. Munoz-Rojas, Mater. Today 14, 119 (2011)
  • [4] C.D. May, J.T. Vaughey, Electrochem. Commun. 6, 1075 (2004)
  • [5] J. Feng, B. Xiao, J.C. Chen, C.T. Zhou, Y.P. Du, R. Zhou, Solid State Commun. 149, 1569 (2009)
  • [6] J.F. Pierson, D. Wiederkehr, J.M. Chappe, N. Martin, Appl. Surf. Sci. 253, 484 (2006)
  • [7] C. Petitjean, D. Horwat, J.F. Pierson, Appl. Surf. Sci. 255, 7700 (2009)
  • [8] C. Petitjean, D. Horwat, J.F. Pierson, J. Phys. D, Appl. Phys. 42, 025304 (2009)
  • [9] S. Uthanna, M. Hari Prasad Reddy, P. Boulet, C. Petitjean, J.F. Pierson, Phys. Status Solidi A 207, 1655 (2010)
  • [10] P. Narayana Reddy, A. Sreedhar, M. Hari Prasad Reddy, S. Uthanna, J.F. Pierson, J. Nanotechnology, 2011, article ID 986021, doi: 10.1155/2011/986021
  • [11] D. Munoz Rojas, J. Oro, P. Gomez-Romero, J. Fraxedas, N. Casan-Pastor, Electrochem. Commun. 4, 684 (2002)
  • [12] ICDD-International centre for diffraction data, ICCD card no. 01-073-6753
  • [13] ICDD-International centre for diffraction data, ICCD card no. 00-41-1104
  • [14] ICDD-International centre for diffraction data, ICCD card no. 01-071-6397
  • [15] ICDD-International centre for diffraction data, ICCD card no. 01-070-9128
  • [16] M.T.S. Nair, L. Guerrero, O.L. Arenas, P.K. Nair, Appl. Surf. Sci. 150, 143 (1999)
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv120n6ap10kz
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