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Number of results
2011 | 120 | 6A | A-25-A-27

Article title

Detection of Shallow Dislocations on 4H-SiC Substrate by Etching Method

Content

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Languages of publication

EN

Abstracts

EN
Correlation between dislocation types in epitaxial 4H-SiC and etch pit types on the 4H-SiC wafer surface were investigated by etch pit method and transmission electron microscope. Shallow dislocation on the wafer was found to form round pit without core. The shallow dislocation was estimated half-loop type in wafer and this estimation explains that step-flow growth converts half-loop dislocation into complex dislocation composed by threading dislocation and basal plane dislocation.

Keywords

EN

Contributors

author
  • Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta, Nagoya 456-8587, Japan
author
  • Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta, Nagoya 456-8587, Japan
author
  • Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta, Nagoya 456-8587, Japan
author
  • Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta, Nagoya 456-8587, Japan
author
  • Toyota Motor Corporation, 1200 Mishuku, Susono, Shizuoka 410-1193, Japan
author
  • Toyota Motor Corporation, 1200 Mishuku, Susono, Shizuoka 410-1193, Japan
author
  • Toyota Motor Corporation, 1200 Mishuku, Susono, Shizuoka 410-1193, Japan
author
  • Toyota Motor Corporation, 1200 Mishuku, Susono, Shizuoka 410-1193, Japan
author
  • Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta, Nagoya 456-8587, Japan

References

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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv120n6ap06kz
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