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2011 | 120 | 3 | 552-557
Article title

Properties of~Rf Plasma Nitrided Silicon Thin Films at Different Rf Plasma Processing Powers

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EN
Abstracts
EN
Nitrided surfaces and composition gradients in thin films exhibit interesting mechanical, electrical and optical properties. Therefore, silicon (Si) thin films were prepared by electron beam evaporation and nitrided by an inductively coupled rf plasma. The effects of successive plasma processing power on structural and optical properties as well as electrical resistivity were examined by different characterization techniques. The Si thin films were transformed gradually into nitrides compound thin films and the amount of nitrogen in the film increased with increasing the rf processing power. The Si nitrided films showed structural, optical and electrical properties that depend on the nitriding power. Increasing the rf plasma processing power caused amorphization, reduced the thickness, increased transmittance, increased resistivity and decreased the reflectance of the Si films. The electrical resistivity increased about eight orders of magnitude when the sample nitrided at 500 W. Different optical band gap were determined indicating the presence of different competing phases in the same film. The decrease in refractive index with plasma treatment power is attributed to the possible change in the bucking density as well as to the increase in the band gap.
Keywords
Contributors
author
  • Physics Department, College of Science, Qassim University, P.O.B. 6644, 51452, Buryadh, Kingdom of Saudi Arabia
  • Physics Department, Faculty of Science, Sohag University, 82524 Sohag, Egypt
author
  • Physics Department, Faculty of Science, Sohag University, 82524 Sohag, Egypt
  • Physics Department, Faculty of Science, Sohag University, 82524 Sohag, Egypt
author
  • Physics Department, College of Science, Qassim University, P.O.B. 6644, 51452, Buryadh, Kingdom of Saudi Arabia
  • Department of Physics, Faculty of Science, Al-Azahar University, Assiut, 71542, Egypt
References
  • 1. I. Gordon, S. Vallon, A. Mayolet, G. Beaucarne, J. Poortmans, Solar Energy Mater. Solar Cells 94, 381 (2010)
  • 2. L. Zhao, Y.H. Zuo, C.L. Zhou, H.L. Li, H.W. Diao, W.J. Wang, Solar Energy 84, 110 (2010)
  • 3. M. Modreanu, M. Gartner, C. Cobianu, B. O'Looney, F. Murphy, Thin Solid Films 450, 105 (2004)
  • 4. J.P. Conde, J. Gaspar, V. Chu, Thin Solid Films 427, 181 (2003)
  • 5. H. Guo, H. Zhao, C. Yin, W. Qiu, Mater. Sci. Eng. B 131, 173 (2006)
  • 6. M.C. Netti, M.D.B. Charlton, G.J. Parker, J.J. Baumberg, Appl. Phys. Lett. 76, 911 (2000)
  • 7. K.C. Mohite, Y.B. Khollam, A.B. Mandale, K.R. Patil, M.G. Takwale, Mater. Lett. 57, 4170 (2003)
  • 8. F. Ay, A. Aydinli, Opt. Mater. 26, 33 (2004)
  • 9. A. Anders, Surf. Coat. Technol. 200, 1893 (2005)
  • 10. M.A. Lieberman, A. Lichtenberg, Principles of Plasma Discharges and Materials Processing, Wiley-Interscience, New York 1994
  • 11. T. Makabe, Z. Lj. Petrovic, Plasma Electronics: Applications in Microelectronic Device Fabrication, Taylor Francis Group, New York 2006
  • 12. T. Hino, M. Harada, Y. Yamauchi, Y. Hirohata, Surf. Coat. Technol. 108-109, 312 (1998)
  • 13. F.-W. Chang, T.-H. Liou, F.-M. Tsai, Thermochem. Acta 354, 71 (2000)
  • 14. O.C. Hellman, N. Herbots, O. Vancauwenberghe, Nucl. Instrum. Methods Phys. Res. B 67, 301 (1992)
  • 15. R. Hezel, N. Lieske, J. Electrochem. Soc. 129, 379 (1982)
  • 16. S. Taniguchi, T. Shibata, K. Nakamura, L. Xianghuai, Z. Zhihong, H. Wei, Z. Shichang, Mater. Sci. Eng. A 121, 519 (1989)
  • 17. R. Hayakawa, T. Yoshimura, A. Ashida, T. Uehara, N. Fujimura, Thin Solid Films 506-507, 423 (2006)
  • 18. R. Perera, A. Ikeda, R. Hattori, Y. Kuroki, Thin Solid Films 423, 212 (2003)
  • 19. J.R. Troxell, J. Electr. Mat. 14, 707 (1985)
  • 20. R.P. Netterfield, P.J. Martin, W.G. Sainty, Appl. Opt. 25, 3808 (1986)
  • 21. J. Petruzello, T.F. McGee, M.H. Frommer, V. Rumennuk, P.A. Walters, C.J. Chou, J. Appl. Phys. 58, 4605 (1985)
  • 22. S. Salimian, C.B. Cooper, M.E. Day, J. Vac. Sci. Technol. B 5, 1606 (1987)
  • 23. K.D. Allen, H.H. Sawin, A. Yokozeki, J. Electrochem. Soc. 133, 2331 (1986)
  • 24. F.M. El-Hossary, N.Z. Negm, S.M. Khalil, A.M. Abd El-Rahman, Thin Solid Films 405, 179 (2002)
  • 25. S.H. Mohamed, A. Anders, Thin Solid Films 515, 5264 (2007)
  • 26. P. Alpuim, P. Ferreira, V. Chu, J.P. Conde, J. Non-Cryst. Solids 299-302, 434 (2002)
  • 27. M. Vila, C. Prieto, R. Ramırez, Thin Solid Films 459, 195 (2004)
  • 28. H. Miyazaki, T. Goto, J. Non-Cryst. Solids 352, 329 (2006)
  • 29. A.M. El-Naggar, A.M. Al-Dhafiri, Opt. Laser Technol. 41, 295 (2009)
  • 30. O.S. Panwar, C. Mukherjee, R. Bhattacharyya, Solar Energy Mater. Solar Cells 57, 373 (1999)
  • 31. J. Mullerova, S. Jurecka, P. Sutta, Solar Energy 80, 667 (2006)
  • 32. R. Ayouchi, R. Schwarz, L.V. Melo, R. Ramalho, E. Alves, C.P. Marques, L. Santos, R. Almeida, O. Conde, Appl. Surf. Sci. 255, 5299 (2009)
  • 33. A. Parashar, S. Kumar, J. Gope, C.M.S. Rauthan, P.N. Dixit, S.A. Hashmi, Solar Energy Mater. Solar Cells 94, 892 (2010)
  • 34. H. Rinnert, M. Vergnat, G. Marchal, A. Burneau, J. Lumin. 80, 445 (1999)
  • 35. T. Ohta, R. Kumar, Y. Yamashita, H. Hoga, J. Vac. Sci. Technol. B 12, 585 (1994)
  • 36. S.V. Deshpande, E. Gulari, S.W. Brown, S.C. Rand, J. Appl. Phys. 77, 6534 (1995)
  • 37. S. Guruvenket, J. Ghatak, P.V. Satyam, G. Mohan Rao, Thin Solid Films 478, 256 (2005)
  • 38. A. Straboni, L. Pichon, T. Girardeau, Surf. Coat. Technol. 125, 100 (2000)
  • 39. V. Verlaan, A.D. Verkerk, W.M. Arnoldbik, C.H.M. van der Werf, R. Bakker, Z.S. Houweling, I.G. Romijn, D.M. Borsa, A.W. Weeber, S.L. Luxembourg, M. Zeman, H.F.W. Dekkers, R.E.I. Schropp, Thin Solid Films 517, 3499 (2009)
  • 40. D.R. Ciarlo, Biomed. Microdev. 4, 63 (2002)
  • 41. L.J. Fernaández, E. Berenschot, J. Sesé, R.J. Wiegerink, J. Flokstra, H.V. Jansen, M. Elwenspoek, Electron. Lett. 41, 124 (2005)
  • 42. K.J. Winchester, J.M. Dell, J. Micromech. Microeng. 11, 589 (2001)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv120n334kz
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