Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams

• Authors: T. Tsvetkova , S. Takahashi , P. Sellin , I. Gomez-Morilla , O. Angelov , D. Dimova-Malinovska , J. Zuk
• Languages of publication: EN

Abstracts

EN

Topographic and optical patterns have been fabricated in a-SiC films with a focused high-energy (1 MeV) H^{+} and He^{+} ion beam and examined with near-field techniques. The patterns have been characterized with atomic force microscopy and scanning near-field optical microscopy to reveal local topography and optical absorption changes as a result of the focused high-energy ion beam induced modification. Apart of a considerable thickness change (thinning tendency), which has been observed in the ion-irradiated areas, the near-field measurements confirm increases of optical absorption in these areas. Although the size of the fabricated optical patterns is in the micron-scale, the present development of the technique allows in principle writing optical patterns up to the nanoscale (several tens of nanometers). The observed values of the optical contrast modulation are sufficient to justify the efficiency of the method for optical data recording using high-energy focused ion beams.

Keywords

EN

41.75.Ak; 42.70.Ln; 68.37.Uv; 73.61.Jc

Discipline

• 41.75.Ak: Positive-ion beams
• 73.61.Jc: Amorphous semiconductors; glasses
• 42.70.Ln: Holographic recording materials; optical storage media
• 68.37.Uv: Near-field scanning microscopy and spectroscopy

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2011
• Volume: 120
• Issue: 1
• Pages: 56-59

Dates

published

2011-07

Contributors

author

T. Tsvetkova

• Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria

author

S. Takahashi

• Centre for Nanostructured Media, School of Mathematics and Physics, The Queen's University of Belfast, Belfast BT7 1NN, UK

author

P. Sellin

• Surrey Ion Beam Centre, Advanced Technology Institute, School of Electronics and Physical Sciences, University of Surrey, Guildford, Surrey GU2 7XH, UK

author

I. Gomez-Morilla

• Surrey Ion Beam Centre, Advanced Technology Institute, School of Electronics and Physical Sciences, University of Surrey, Guildford, Surrey GU2 7XH, UK

author

O. Angelov

• Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria

author

D. Dimova-Malinovska

• Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria

author

J. Zuk

• Institute of Physics, Maria Curie-Skłodowska University, pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland

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Identifiers

DOI

10.12693/APhysPolA.120.56