PL EN


Preferences help
enabled [disable] Abstract
Number of results
2011 | 120 | 1 | 56-59
Article title

Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams

Content
Title variants
Languages of publication
EN
Abstracts
EN
Topographic and optical patterns have been fabricated in a-SiC films with a focused high-energy (1 MeV) H^{+} and He^{+} ion beam and examined with near-field techniques. The patterns have been characterized with atomic force microscopy and scanning near-field optical microscopy to reveal local topography and optical absorption changes as a result of the focused high-energy ion beam induced modification. Apart of a considerable thickness change (thinning tendency), which has been observed in the ion-irradiated areas, the near-field measurements confirm increases of optical absorption in these areas. Although the size of the fabricated optical patterns is in the micron-scale, the present development of the technique allows in principle writing optical patterns up to the nanoscale (several tens of nanometers). The observed values of the optical contrast modulation are sufficient to justify the efficiency of the method for optical data recording using high-energy focused ion beams.
Keywords
Contributors
author
  • Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria
author
  • Centre for Nanostructured Media, School of Mathematics and Physics, The Queen's University of Belfast, Belfast BT7 1NN, UK
author
  • Surrey Ion Beam Centre, Advanced Technology Institute, School of Electronics and Physical Sciences, University of Surrey, Guildford, Surrey GU2 7XH, UK
  • Surrey Ion Beam Centre, Advanced Technology Institute, School of Electronics and Physical Sciences, University of Surrey, Guildford, Surrey GU2 7XH, UK
author
  • Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria
  • Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria
author
  • Institute of Physics, Maria Curie-Skłodowska University, pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland
References
  • 1. J. Bullot, M.P. Schmidt, Phys. Status Solidi B 143, 345 (1987)
  • 2. J.A. Powell, L. Matus, in: Amorphous and Crystalline Silicon Carbide, Eds. G.L. Harris, C.Y.W. Yang, Springer, Berlin 1989
  • 3. Amorphous and Microcrystalline Semiconductor Devices, Ed. J. Kanicki, Artech House, Boston 1991
  • 4. T. Nagai, H. Yamamoto, I. Kobayashi, J. Phys. E 15, 520 (1982)
  • 5. J.K. Hirvonen, Ion Implantation and Ion Beam Processing of Materials, North Holland, Amsterdam 1984
  • 6. J.F. Ziegler, Ion Implantation, Academic Press, New York 1988
  • 7. K. Böhringer, K. Jousten, S. Kalbitzer, Nucl. Instrum. Methods Phys. Res. B 30, 289 (1988)
  • 8. B. Ruttensperger, G. Krötz, G. Müller, G. Derst, S. Kalbitzer, J. Non-Cryst. Solids 137-138, 635 (1991)
  • 9. G. Müller, Nucl. Instrum. Methods Phys. Res. B 80-81, 957 (1993)
  • 10. T. Tsvetkova, in: Beam Processing of Advanced Materials, Eds. J. Singh, S. Copley, J. Mazumder, ASM International, Metals Park 1996, p. 207
  • 11. T. Tsvetkova, S. Takahashi, A. Zayats, P. Dawson, R. Turner, L. Bischoff, O. Angelov, D. Dimova-Malinovska, Vacuum 79, 94 (2005)
  • 12. T. Tsvetkova, S. Takahashi, A. Zayats, P. Dawson, R. Turner, L. Bischoff, O. Angelov, D. Dimova-Malinovska, Vacuum 79, 100 (2005)
  • 13. S. Takahashi, P. Dawson, A.V. Zayats, L. Bischoff, O. Angelov, D. Dimova-Malinovska, T. Tsvetkova, P.D. Townsend, J. Phys. D, Appl. Phys. 40, 7492 (2007)
  • 14. T. Tsvetkova, P. Sellin, R. Carius, O. Angelov, D. Dimova-Malinovska, J. Optoelectron. Adv. Mater. 9, 375 (2007)
  • 15. T. Tsvetkova, P. Sellin, R. Carius, O. Angelov, D. Dimova-Malinovska, J. Zuk, Nucl. Instrum. Methods Phys. Res. B 267, 1583 (2009)
  • 16. G. Binning, C.F. Quate, Ch. Gerber, Phys. Rev. Lett. 56, 930 (1986)
  • 17. G. Friedbacher, H. Fuchs, Pure Appl. Chem. 71, 1337 (1999)
  • 18. Near Field Optics, Eds. D.W. Pohl, D. Courjon, Kluwer Academic Publishers, Dordrecht 1993
  • 19. D. Richards, A.V. Zayats, Nano-Optics and Near-Field Microscopy, Eds. D. Richards, A.V. Zayats, Artech House, Boston 2008
  • 20. S. Kalbitzer, Nucl. Instrum. Methods Phys. Res. B 218, 343 (2004)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv120n114kz
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.