Structural Characteristics and Optical Properties of Thermally Oxidized Zinc Films

• Authors: D. Rusu , G. Rusu , D. Luca
• Languages of publication: EN

Abstracts

EN

Zinc oxide (ZnO) thin films (with thickness ranged from 780 nm to 1150 nm) were prepared by thermal oxidation in air (at 600-700 K, for 20-30 min) of vacuum evaporated metallic zinc films. The Zn films were deposited on glass substrates at room temperature. The crystalline structure of ZnO thin film samples was investigated using X-ray diffraction technique. The diffraction patterns revealed that the ZnO thin films were polycrystalline and have a wurtzite (hexagonal) structure. The film crystallites are preferentially oriented with (002) planes parallel to substrate surface. Some important structural parameters (lattice parameters of the hexagonal cell, crystallite size, Zn-O bond length, residual stress, etc.) of the films were determined. The surface morphology of the prepared ZnO thin films, investigated by atomic force microscopy, revealed a uniform columnar structure. The spectral dependence of transmission coefficient has been studied in the wavelength range from 300 nm to 1700 nm. The optical energy band gap calculated from the absorption spectra (supposing allowed direct band-to-band transitions) are in the range 3.17-3.19 eV. The dependence of the microstructural and optical characteristics on the preparation conditions (oxidation temperature, oxidation time, etc.) of the oxidized zinc films is discussed.

Keywords

EN

77.55.hf; 68.55.-a; 68.55.J-; 81.15.Aa; 78.20.-e

Discipline

• 81.15.Aa: Theory and models of film growth
• 78.20.-e: Optical properties of bulk materials and thin films(for optical properties related to materials treatment, see 81.40.Tv; for optical materials, see 42.70-a; for optical properties of superconductors, see 74.25.Gz; for optical properties of rocks and minerals, see 91.60.Mk; for optical properties of specific thin films, see 78.66.-w)
• 68.55.J-: Morphology of films
• 77.55.hf: ZnO
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2011
• Volume: 119
• Issue: 6
• Pages: 850-856

Dates

published

2011-06

received

2010-10-24

(unknown)

2011-02-10

(unknown)

2011-03-10

Contributors

author

D. Rusu

• Faculty of Physics, "Al. I. Cuza" University, 11 Carol I Blvd., 700506 Iasi, Romania

author

G. Rusu

• Faculty of Physics, "Al. I. Cuza" University, 11 Carol I Blvd., 700506 Iasi, Romania

author

D. Luca

• Faculty of Physics, "Al. I. Cuza" University, 11 Carol I Blvd., 700506 Iasi, Romania

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Identifiers

DOI

10.12693/APhysPolA.119.850