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2011 | 119 | 3 | 447-450
Article title

Three-Dimensional Simulations of the Anisotropic Etching Profile Evolution for Producing Nanoscale Devices

Content
Title variants
Languages of publication
EN
Abstracts
EN
Refined control of etched profiles is one of the most important tasks of micro (nano) electro mechanical systems manufacturing process. In spite of its wide use, the simulation of etching for micro (nano) electro mechanical systems applications has been so far a partial success only, although a great number of commercial and academic research tools dedicated to this problem are developed. In this paper we describe an application of the sparse field method for solving level set equations in 3D anisotropic wet etching of silicon with potassium hydroxide (KOH). Angular dependence of the silicon etching rate is determined on the basis of the silicon crystal symmetry properties. Some examples illustrating developed methodology are given.
Keywords
EN
Publisher

Year
Volume
119
Issue
3
Pages
447-450
Physical description
Dates
published
2011-03
received
2010-02-27
(unknown)
2010-11-18
Contributors
  • Institute of Physics, Pregrevica 118, 11080 Belgrade, Serbia
  • Institute of Physics, Pregrevica 118, 11080 Belgrade, Serbia
References
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  • 3. S. Osher, R. Fedkiw, Level Set Method and Dynamic Implicit Surfaces, Springer-Verlag, New York, NY 2003
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  • 5. L. Evans, Partial Differential Eqautions, American Mathematical Society, Providence, RI 1998
  • 6. B. Radjenović, J.K. Lee, M. Radmilović-Radjenović, Computer Phys. Commun. 174, 127 (2006)
  • 7. J.A. Sethian, D. Adalsteinsson, IEEE Trans. Semicond. Dev. 10, 167 (1996)
  • 8. T.J. Hubbard, Ph.D. Thesis, California Institute of Technology, 1994
  • 9. K. Sato, M. Shikida, Y. Matsushima, T. Yamashiro, Sensors Actuators A 64, 87 (1988)
  • 10. NLM Insight Segmentation and Registration Toolkit, http://www.itk.org
  • 11. M. Buerger, Elementary Crystallography, Wiley, New York, Chapman & Hall, London 1956
  • 12. M. Shikida, K. Sato, K. Tokoro, D. Uchikawa, Sensors Actuators A 80, 179 (2000)
  • 13. B. Radjenović, M. Radmilović-Radjenović, M. Mitrić, Appl. Phys. Lett. 89, 213102 (2006)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv119n328kz
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