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Number of results
2011 | 119 | 2 | 222-224

Article title

Monte Carlo Analysis of Impact Ionization in Isolated-Gate InAs/AlSb High Electron Mobility Transistors

Content

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Languages of publication

EN

Abstracts

EN
We perform a physical analysis of the kink effect in InAs/AlSb high electron mobility transistors by means of a semiclassical 2D ensemble Monte Carlo simulator. Due to the small bandgap of InAs, InAs/AlSb high electron mobility transistors are very susceptible to suffer from impact ionization processes, with the subsequent hole transport through the structure, both implicated in the kink effect. When the drain-to-source voltage V_{DS} is high enough for the onset of impact ionization, holes generated tend to pile up at the gate-drain side of the buffer. This occurs due to the valence-band energy barrier between the buffer and the channel. Because of this accumulation of positive charge, the channel is further opened and the drain current I_{D} increases, leading to the kink effect in the I-V characteristics.

Keywords

EN

Contributors

author
  • Dpto. Física Aplicada, Universidad de Salamanca, Plaza de la Merced s/n, 37008 Salamanca, Spain
author
  • Dpto. Física Aplicada, Universidad de Salamanca, Plaza de la Merced s/n, 37008 Salamanca, Spain
author
  • Dpto. Física Aplicada, Universidad de Salamanca, Plaza de la Merced s/n, 37008 Salamanca, Spain
author
  • Osram Semiconductor, Regensburg, Germany
author
  • Department of Microtechnology and Nanoscience - MC2, Chalmers, University of Technology, SE-412 96 Göteborg, Sweden
author
  • Department of Microtechnology and Nanoscience - MC2, Chalmers, University of Technology, SE-412 96 Göteborg, Sweden
author
  • Dpto. Física Aplicada, Universidad de Salamanca, Plaza de la Merced s/n, 37008 Salamanca, Spain

References

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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv119n240kz
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