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Abstracts
Rib waveguides were fabricated with the use of selective, wet chemical etching of two-component waveguide films SiO_2:TiO_2 which were obtained using sol-gel method. Photoresist was applied as a mask in the process. The etching of the films SiO_2:TiO_2 was carried out in water solution of ammonia fluoride. The paper presents the results of theoretical analysis as well as the power distributions in the fabricated strip waveguides.
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Year
Volume
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Pages
1168-1170
Physical description
Dates
published
2010-12
Contributors
author
- Department of Optoelectronics, Silesian University of Technology, Krzywoustego 2, 44-100 Gliwice, Poland
author
- Department of Optoelectronics, Silesian University of Technology, Krzywoustego 2, 44-100 Gliwice, Poland
author
- Department of Optoelectronics, Silesian University of Technology, Krzywoustego 2, 44-100 Gliwice, Poland
References
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Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv118n620kz