Electrical Resistance Anomalies in Holmium Thin Films below 20 K in Magnetic Field

• Authors: J. Dudáš , S. Gabáni , V. Kavečanský , I. Gościańska , J. Bagi
• Languages of publication: EN

Abstracts

EN

Electrical resistance (R) of Ho thin films evaporated in vacuum ≈ 10^{-7} Pa was studied in a temperature range from 2 K up to 300 K and in magnetic field up to 9 T. Measurements showed resistance anomalies below 20 K - minima of R value in 36 nm and 215 nm thin films and resistivity maximum at 3.58 K in 215 nm Ho film. Increasing value of the magnetic field, applied perpendicular to film surface up to 5 T, caused increasing suppression of the R minima in these films with subsequent disappearance of them in fields above 5 T. Maximum of R value in 215 nm thin film at 3.58 K decreased with increasing flux density up to 5 T and it was suppressed at fields above 5 T. X-ray diffraction of these films revealed two phases composition consisting of the hexagonal Ho and of cubic HoH_2. The preferential crystal orientation of both phases was detected.

Keywords

EN

73.61.At; 75.70.Ak; 68.55.Nq

Discipline

• 75.70.Ak: Magnetic properties of monolayers and thin films
• 68.55.Nq: Composition and phase identification
• 73.61.At: Metal and metallic alloys

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2010
• Volume: 118
• Issue: 5
• Pages: 843-845

Dates

published

2010-11

Contributors

author

J. Dudáš

• Dep. of Theoretical Electrotechnics and Electrical Measurement, TU, Park Komenského 3, SK-043 89 Košice, Slovakia

author

S. Gabáni

• Institute of Experimental Physics, SAS, SK-043 53 Košice, Slovakia

author

V. Kavečanský

• Institute of Experimental Physics, SAS, SK-043 53 Košice, Slovakia

author

I. Gościańska

• Institute of Physics, A. Mickiewicz University, PL-61-614 Poznań, Poland

author

J. Bagi

• Húskova 61, 041 11 Košice, Slovakia

References

• 1. P. Grünberg, Acta Mater. 48, 239 (2000)
• 2. J. Dudáš, M. Guzan, S. Gabáni, V. Kavečanský, K. Flachbart, M. Konč, I. Gościańska, Czech. J. Phys. 54, Suppl. D, 253 (2004)
• 3. J.N. Daou, P. Vajda, Phys. Rev. B 50, 12635 (1994)
• 4. P. Vajda, G. André, O.J. Zogal, Phys. Rev. B 57, 5830 (1998)

Identifiers

DOI

10.12693/APhysPolA.118.843