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2010 | 118 | 4 | 585-588

Article title

Electrical Breakdown Mechanisms in Vacuum Diodes

Content

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Languages of publication

EN

Abstracts

EN
This paper investigates the roles of different mechanisms constituting the process of electrical breakdown in vacuum. Random variable "vacuum breakdown voltage" was measured for pulse breakdowns in five types of vacuum diodes, with different values of vacuum pressure and inter-electrode gap. Conclusions about the influence of vacuum pressure and inter-electrode distance on the parameters of theoretical statistical distributions have been drawn. Based on the distribution to which the "vacuum breakdown voltage" random variable adheres, the dominance of certain breakdown mechanisms has been established for specific ranges of vacuum pressure. The observed absence of anode vacuum breakdown at small inter-electrode gaps has been given a theoretical interpretation.

Keywords

EN

Contributors

  • Faculty of Electrical Engineering, University of Belgrade, Bulevar Kralja Aleksandra 73, P.O. Box 3554, 11000 Belgrade, Serbia
author
  • Mektronik Zemun, 11080 Zemun, Serbia
author
  • Faculty of Electrical Engineering, University of Belgrade, Bulevar Kralja Aleksandra 73, P.O. Box 3554, 11000 Belgrade, Serbia
author
  • Faculty of Electrical Engineering, University of Belgrade, Bulevar Kralja Aleksandra 73, P.O. Box 3554, 11000 Belgrade, Serbia
author
  • Faculty of Technology and Metallurgy, University of Belgrade, Karnegijeva 4, 11120 Belgrade, Serbia

References

  • 1. Electrical Breakdown of Gases, Eds. J.M. Meek, J.D. Crags, Wiley, New York 1978
  • 2. B. Loncar, P. Osmokrovic, A. Vasic, S. Stankovic, IEEE Trans. Plasma Sci. 34, 1561 (2006)
  • 3. P. Osmokrovic, N. Kartalovic, IEEE Trans. Power Syst. 12, 1455 (1997)
  • 4. G.E. Vibrans, J. Appl. Phys. 35, 2855 (1964)
  • 5. P.A. Chatterton, Proc. Phys. Soc. Lond. 88, 231 (1966)
  • 6. D.W. Williams, W.T. Williams, J. Phys. D, Appl. Phys. 5, 280 (1972)
  • 7. D.K. Davies, M.A. Biondi, J. Appl. Phys. 42, 3089 (1971)
  • 8. P.A. Chatterton, M.M. Menon, K.D. Srivastava, J. Appl. Phys. 43, 4536 (1972)
  • 9. R.V. Latham, J. Phys. D, Appl. Phys. 5, 2049 (1972)
  • 10. P.A. Chatterton, in Ref. [1], p. 75
  • 11. P. Osmokrović, T. Živić, B. Lončar, A. Vasić, Plasma Sources Sci. Technol. 15, 703 (2006)
  • 12. G.R. Werner, Ph.D. Thesis, Cornell Univ., 2004

Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv118n410kz
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