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2010 | 117 | 1 | 34-37

Article title

Properties of ZnO and ZnMnO Thin Films Obtained by Pulsed Laser Ablation

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EN

Abstracts

EN
The results of experimental investigation of structural and physical properties of ZnO and ZnMnO films are presented in this work. The films of ZnO and Zn_{1-x}Mn_{x}O of different thickness were obtained on Al_{2}O_{3}, glass, and KCl substrates in vacuum of 1 × 10^{-5} Torr by the pulsed laser deposition method. The samples were obtained under the substrate temperature 300-473 K. A thickness of films was in the range of 0.5-1 μm depending on the number of laser pulses. The structure of target bulk materials was investigated by X-ray diffraction method. A structure of laser deposited films was investigated by the transmission high-energy electron diffraction method. Electric resistivity was measured in the temperature range 77-450 K. The presence of two activation energies in the temperature range 300-330 K and 330-450 K is followed from the analysis of the films electrical resistivity. These activation energies correspond to two deep donor's energy levels. The shallow donor's level is connected with manganese presence. Optical transmission of ZnO and ZnMnO films deposited at various temperatures were investigated.

Keywords

Contributors

author
  • Drogobych State Pedagogical University, I. Franko st., 24, 82100 Drogobych, Ukraine
  • Lviv Polytechnic National University, Bandera st., 12, 79013 Lviv, Ukraine
author
  • Drogobych State Pedagogical University, I. Franko st., 24, 82100 Drogobych, Ukraine
author
  • Drogobych State Pedagogical University, I. Franko st., 24, 82100 Drogobych, Ukraine
author
  • Lviv Polytechnic National University, Bandera st., 12, 79013 Lviv, Ukraine
author
  • Lviv Polytechnic National University, Bandera st., 12, 79013 Lviv, Ukraine
author
  • Lviv Polytechnic National University, Bandera st., 12, 79013 Lviv, Ukraine
author
  • Rzeszów University, Rejtana 16A, 35-310 Rzeszów, Poland

References

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  • 2. V. Khranovskyy, J. Eriksson, A. Lloyd-Spetznita, R. Yakimova, L. Hultman, Thin Solid Films 517, 2073 (2009)
  • 3. I. Lorite, F. Rubio-Marcos, J.J. Romero, J.F. Fernández, Mater. Lett. 63, 212 (2009)
  • 4. I.S. Virt, M. Bester, Ł. Dumański, M. Kuźma, I.O. Rudyi, M.S. Frugynskyi, I.V. Kurilo, Appl. Surf. Sci. 177, 201 (2001)
  • 5. P. Sagan, G. Wisz, M. Bester, I.O. Rudyj, I.V. Kurilo, I.E. Lopatynskij, I.S. Virt, M. Kuzma, R. Ciach, Thin Solids Films 480-481, 318 (2005)
  • 6. Joint Committee on Powder Diffraction Standards (JCPDS) diffraction data card, American Society for Testing and Materials (ASTM)
  • 7. B.D. Cullity, Elements of X-ray Diffraction, 2nd ed., Addison-Wesley, Reading, MA 1978, pp. 284, 366
  • 8. Z.G. Pinsker, Electron Diffraction, Butterworths Sci. Publ., London 1953
  • 9. Y. Belghazi, M.A. Aouaj, M. El Yadari, G. Schmerber, C. Ulhaq-Bouillet, C. Leuvrey, S. Colisa, M. Abd-lefdil, A. Berrada, A. Dinia, Microelectron. J. 40, 265 (2009)

Document Type

Publication order reference

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YADDA identifier

bwmeta1.element.bwnjournal-article-appv117z107kz
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