Nanostructured Thin Films β-Al-Mg Obtained Using PLD Technique

• Authors: A. Radziszewska , S. Kąc , M. Feuerbacher
• Languages of publication: EN

Abstracts

EN

In this work, the pulsed laser deposition (PLD) technique was used to grow AlMg thin films from a β-Mg_{2}Al_{3} target with nominal composition: 39.09 at.% Mg and 60.91 at.% Al. The paper presents the study of β-Mg_{2}Al_{3} thin films deposited using the pulsed laser deposition technique. AlMg thin films were prepared on Si (400) substrates and deposited by means of using a QS-Nd:YAG laser (λ = 266, 355 nm). Samples were prepared with laser fluence (1.1 J/cm^{2} and 1.6 J/cm^{2}) and at two different substrate (Si) temperatures (25°C and 200°C). The target possessed columnar structure and changes in chemical composition took place as a result of the influence of the laser irradiation. Investigations focused on structure and chemical composition showed that the films generally had nanocrystalline structure and that the quantity of Al and Mg varied in the films.

Keywords

EN

68.55.-a; 68.55.Nq; 81.15.-z; 52.38.Mf

Discipline

• 52.38.Mf: Laser ablation(see also 79.20.Ds, Laser-beam impact phenomena)
• 68.55.Nq: Composition and phase identification
• 81.15.-z: Methods of deposition of films and coatings; film growth and epitaxy(for structure of thin films, see 68.55.-a; see also 85.40.Sz Deposition technology in microelectronics; for epitaxial dielectric films, see 77.55.Px)
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2010
• Volume: 117
• Issue: 5
• Pages: 799-802

Dates

published

2010-05

Contributors

author

A. Radziszewska

• Faculty of Metals Engineering and Industrial Computer Science, AGH University of Science and Technology, al. Mickiewicza 30, 30-059 Kraków, Poland

author

S. Kąc

• Faculty of Metals Engineering and Industrial Computer Science, AGH University of Science and Technology, al. Mickiewicza 30, 30-059 Kraków, Poland

author

M. Feuerbacher

• Institut für Mikrostrukturforschung, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany

References

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• 3. R. Eason, Pulsed Laser Deposition of Thin Films, Wiley, Hoboken 2007
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• 5. C.B. Arnold, M.J. Aziz, Appl. Phys. A 69 S23 (1999)
• 6. M. Feuerbacher, C. Thomas, K. Urban, Quasicrystals, VCH Wiley, 2003
• 7. A. Radziszewska, Inżynieria Materiałowa. 3-4 720 (2007)

Identifiers

DOI

10.12693/APhysPolA.117.799