Imaging and Patterning on Nanometer Scale Using Coherent EUV Light

• Authors: P. Wachulak , M. Marconi , C. Menoni , J. Rocca , H. Fiedorowicz , A. Bartnik
• Languages of publication: EN

Abstracts

EN

Extreme ultraviolet (EUV) covers wavelength range from about 5 nm to 50 nm. That is why EUV is especially applicable for imaging and patterning on nanometer scale length. In the paper periodic nanopatterning realized by interference lithography and high resolution holographic nanoimaging performed in a Gabor in-line scheme are presented. In the experiments a compact table top EUV laser was used. Preliminary studies on using a laser plasma EUV source for nanoimaging are presented as well.

Keywords

EN

42.25.Hz; 42.40.Ht; 42.40.-i; 42.55.Vc

Discipline

• 42.55.Vc: X- and γ-ray lasers
• 42.40.Ht: Hologram recording and readout methods(see also 42.70.Ln Holographic recording materials; optical storage media)
• 42.40.-i: Holography
• 42.25.Hz: Interference

• Journal: Acta Physica Polonica A
• Year: 2010
• Volume: 117
• Issue: 2
• Pages: 403-407

Dates

published

2010-02

Contributors

author

P. Wachulak

• Institute of Optoelectronics, Military University of Technology, Gen. S. Kaliskiego 2, 00-908 Warsaw, Poland

author

M. Marconi

• Electrical and Computer Engineering, Colorado State University, 1320 Campus Delivery, Engineering Res. Center, Fort Collins, CO, USA

author

C. Menoni

• Electrical and Computer Engineering, Colorado State University, 1320 Campus Delivery, Engineering Res. Center, Fort Collins, CO, USA

author

J. Rocca

• Electrical and Computer Engineering, Colorado State University, 1320 Campus Delivery, Engineering Res. Center, Fort Collins, CO, USA

author

H. Fiedorowicz

• Institute of Optoelectronics, Military University of Technology, Gen. S. Kaliskiego 2, 00-908 Warsaw, Poland

author

A. Bartnik

• Institute of Optoelectronics, Military University of Technology, Gen. S. Kaliskiego 2, 00-908 Warsaw, Poland

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Identifiers

DOI

10.12693/APhysPolA.117.403