Raith - Electron Beam Lithography for Research

• Authors: M. Kirchner , M. Kahl
• Languages of publication: EN
• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2009
• Volume: 116
• Issue: S
• Pages: S-198-S-200

Dates

published

2009-12

Contributors

author

M. Kirchner

• Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund, Germany

author

M. Kahl

• Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund, Germany

References

• 1. F. Robin, Electron-Beam Lithography Applications at ETH Zurich, Raith application note. Raith GmbH, 2006.
• 2. M.A. McCord, M.J. Rooks, in: Handbook of Microlithography, Micromachining, and Microfabrication, Vol. 1, Ed. P. Rai-Choudhury, 1997, p. 139
• 3. E.A. Shields, F. Williamson, J.R. Leger, J. Vac. Sci. Technol. B 21, 1453 (2003)
• 4. G. Piaszenski, U. Barth, A. Rudzinski, A. Rampe, A. Fuchs, M. Bender, U. Plachetka, Microelectron. Eng. 84, 945 (2007)
• 5. Technical description of the Raith150TWO instrument, Raith Germany
• 6. 'Understanding of Hydrogen Silsesquioxane Electron Resist for Sub-5 nm-Half-Pitch Lithography', K.W. Joel Yang (MIT), oral presentation at EIBPN Conference, 2009
• 7. J.K.W. Yang, K.K. Berggren, J. Vac. Sci. Technol. B 25, 2025 (2007)
• 8. S. Bauerdick, A. Linden, C. Stampfer, T. Helbling, C. Hierold, J. Vac. Sci. Technol. B 24, 3144 (2006)
• 9. F. Robin, S. Costea, G. Stark, R. Wüest, P. Strasser, H. Jäckel, 'Accurate Proximity-Effect Correction of Nanoscale Structures with NanoPECS', Raith application note, Raith GmbH
• 10. L.J. Martinez, I. Prieto, B. Alen, P.A. Postigo, J. Vac. Sci. Technol. B 27, 1801 (2009)
• 11. M. Kahl, 'Zero Stitching Error Using Fixed Beam Moving Stage (FBMS) Mode', Raith application note, Raith GmbH, 2005

Identifiers

DOI

10.12693/APhysPolA.116.S-198