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2009 | 116 | S | S-198-S-200
Article title

Raith - Electron Beam Lithography for Research

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Content
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Languages of publication
EN
Abstracts
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Publisher

Year
Volume
116
Issue
S
Pages
S-198-S-200
Physical description
Dates
published
2009-12
Contributors
author
  • Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund, Germany
author
  • Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund, Germany
References
  • 1. F. Robin, Electron-Beam Lithography Applications at ETH Zurich, Raith application note. Raith GmbH, 2006.
  • 2. M.A. McCord, M.J. Rooks, in: Handbook of Microlithography, Micromachining, and Microfabrication, Vol. 1, Ed. P. Rai-Choudhury, 1997, p. 139
  • 3. E.A. Shields, F. Williamson, J.R. Leger, J. Vac. Sci. Technol. B 21, 1453 (2003)
  • 4. G. Piaszenski, U. Barth, A. Rudzinski, A. Rampe, A. Fuchs, M. Bender, U. Plachetka, Microelectron. Eng. 84, 945 (2007)
  • 5. Technical description of the Raith150TWO instrument, Raith Germany
  • 6. 'Understanding of Hydrogen Silsesquioxane Electron Resist for Sub-5 nm-Half-Pitch Lithography', K.W. Joel Yang (MIT), oral presentation at EIBPN Conference, 2009
  • 7. J.K.W. Yang, K.K. Berggren, J. Vac. Sci. Technol. B 25, 2025 (2007)
  • 8. S. Bauerdick, A. Linden, C. Stampfer, T. Helbling, C. Hierold, J. Vac. Sci. Technol. B 24, 3144 (2006)
  • 9. F. Robin, S. Costea, G. Stark, R. Wüest, P. Strasser, H. Jäckel, 'Accurate Proximity-Effect Correction of Nanoscale Structures with NanoPECS', Raith application note, Raith GmbH
  • 10. L.J. Martinez, I. Prieto, B. Alen, P.A. Postigo, J. Vac. Sci. Technol. B 27, 1801 (2009)
  • 11. M. Kahl, 'Zero Stitching Error Using Fixed Beam Moving Stage (FBMS) Mode', Raith application note, Raith GmbH, 2005
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv116ns58kz
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