Full Field Nanoimprint on Mask Aligners Using Substrate Conformal Imprint Lithography Technique

• Authors: Ran Ji , A. Krüger , M. Hornung , M. Verschuuren , R. van de Laar , J. van Eekelen
• Languages of publication: EN
• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2009
• Volume: 116
• Issue: S
• Pages: S-187-S-189

Dates

published

2009-12

Contributors

author

Ran Ji

• SUSS MicroTec Lithography GmbH, Garching, Germany

author

A. Krüger

• SUSS MicroTec Lithography GmbH, Garching, Germany

author

M. Hornung

• SUSS MicroTec Lithography GmbH, Garching, Germany

author

M. Verschuuren

• Philips Research, Eindhoven, Netherlands

author

R. van de Laar

• Philips Research, Eindhoven, Netherlands

author

J. van Eekelen

• Philips Research, Eindhoven, Netherlands

References

• 1. A.C. Tobey, Electronics 52, 109 (1979).
• 2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, J. Appl. Phys. Lett. 67, 3114 (1996)
• 3. International technology roadmap for semiconductors, 2003 edition, 'lithography', http://www.itrs.net/links/2003ITRS/Litho2003.pdf
• 4. M. Bender, M. Otto, B. Hadam, B. Vratzov, B. Spangenberg, H. Kurz, Microelectron. Eng. 53, 233 (2000)
• 5. M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz, T. Glinsner, F. Lindner, J. Vac. Sci. Technol. B 22, 3229 (2004)
• 6. M. Verschuuren, H. van Sprang, Mater. Res. Soc. Symp. Proc. 1002, 1002-N03-05 (2007)
• 7. U. Plachetka, M. Bender, A. Fuchs, T. Wahlbrink, T. Glinsner, H. Kurz, Microelectron. Eng. 83, 944 (2006)
• 8. M. Beck, M. Graczyk, I. Maximov, E.-L. Sarwe, T.G.I. Ling, M. Keil, L. Montelius, Microelectron. Eng. 61-62, 441 (2001)

Identifiers

DOI

10.12693/APhysPolA.116.S-187