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2009 | 116 | S | S-187-S-189
Article title

Full Field Nanoimprint on Mask Aligners Using Substrate Conformal Imprint Lithography Technique

Content
Title variants
Languages of publication
EN
Abstracts
Keywords
Publisher

Year
Volume
116
Issue
S
Pages
S-187-S-189
Physical description
Dates
published
2009-12
Contributors
author
  • SUSS MicroTec Lithography GmbH, Garching, Germany
author
  • SUSS MicroTec Lithography GmbH, Garching, Germany
author
  • SUSS MicroTec Lithography GmbH, Garching, Germany
  • Philips Research, Eindhoven, Netherlands
  • Philips Research, Eindhoven, Netherlands
  • Philips Research, Eindhoven, Netherlands
References
  • 1. A.C. Tobey, Electronics 52, 109 (1979).
  • 2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, J. Appl. Phys. Lett. 67, 3114 (1996)
  • 3. International technology roadmap for semiconductors, 2003 edition, 'lithography', http://www.itrs.net/links/2003ITRS/Litho2003.pdf
  • 4. M. Bender, M. Otto, B. Hadam, B. Vratzov, B. Spangenberg, H. Kurz, Microelectron. Eng. 53, 233 (2000)
  • 5. M. Bender, U. Plachetka, J. Ran, A. Fuchs, B. Vratzov, H. Kurz, T. Glinsner, F. Lindner, J. Vac. Sci. Technol. B 22, 3229 (2004)
  • 6. M. Verschuuren, H. van Sprang, Mater. Res. Soc. Symp. Proc. 1002, 1002-N03-05 (2007)
  • 7. U. Plachetka, M. Bender, A. Fuchs, T. Wahlbrink, T. Glinsner, H. Kurz, Microelectron. Eng. 83, 944 (2006)
  • 8. M. Beck, M. Graczyk, I. Maximov, E.-L. Sarwe, T.G.I. Ling, M. Keil, L. Montelius, Microelectron. Eng. 61-62, 441 (2001)
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv116ns53kz
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