Analysis of Interaction of Surfactant Molecules with Si(hkl) Planes on the Basis of Anisotropic Etching in Alkaline Solutions

• Authors: I. Zubel , M. Kramkowska
• Languages of publication: EN

Abstracts

EN

In the paper, measurements of surface tension of solutions used for silicon etching and results of etching in the solutions are presented. Based on the obtained results, the analysis of interactions of surfactants with differently oriented silicon planes has been carried out.

Keywords

EN

61.30.Hn; 61.72.uj; 64.70.kg

Discipline

• 61.72.uj: III-V and II-VI semiconductors
• 61.30.Hn: Surface phenomena: alignment, anchoring, anchoring transitions, surface-induced layering, surface-induced ordering, wetting, prewetting transitions, and wetting transitions
• 64.70.kg: Semiconductors

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2009
• Volume: 116
• Issue: S
• Pages: S-105-S-107

Dates

published

2009-12

Contributors

author

I. Zubel

• Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland

author

M. Kramkowska

• Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland

References

• 1. I. Zubel, M. Kramkowska, Sens. Actuat A 115, 549 (2004)
• 2. K. Szymczyk, B. Janczuk, J. Colloid Interface Sci. 303, 319 (2006)

Identifiers

DOI

10.12693/APhysPolA.116.S-105