PL EN


Preferences help
enabled [disable] Abstract
Number of results
2009 | 116 | S | S-105-S-107
Article title

Analysis of Interaction of Surfactant Molecules with Si(hkl) Planes on the Basis of Anisotropic Etching in Alkaline Solutions

Content
Title variants
Languages of publication
EN
Abstracts
EN
In the paper, measurements of surface tension of solutions used for silicon etching and results of etching in the solutions are presented. Based on the obtained results, the analysis of interactions of surfactants with differently oriented silicon planes has been carried out.
Keywords
EN
Contributors
author
  • Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland
author
  • Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland
References
  • 1. I. Zubel, M. Kramkowska, Sens. Actuat A 115, 549 (2004)
  • 2. K. Szymczyk, B. Janczuk, J. Colloid Interface Sci. 303, 319 (2006)
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv116ns28kz
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.