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2009 | 116 | S | S-19-S-21

Article title

Barriers in Miniaturization of Electronic Devices and the Ways to Overcome Them - from a Planar to 3D Device Architecture

Content

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EN

Abstracts

EN
We witness a new revolution in electronic industry - a new generation of integrated circuits uses as a gate isolator HfO_{2}. This high-k oxide was deposited by the atomic layer deposition technique. The atomic layer deposition, due to a high conformality of deposited films and low growth temperature, has a large potential to be widely used not only for the deposition of high-k oxides, but also of materials used in solar cells and semiconductor/organic material hybrid structures. This opens possibilities of construction of novel memory devices with 3D architecture, photovoltaic panels of the third generation and stable in time organic light emitting diodes as discussed in this work.

Keywords

Contributors

author
  • Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
  • Dept. of Mathematics and Natural Sciences, College of Science, Cardinal Stefan Wyszyński University, Warsaw, Poland
author
  • Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
  • Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
author
  • Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
author
  • Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
author
  • Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
author
  • Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

References

  • 1. G.E. Moore, Electronics 38, 4 (1965)
  • 2. http://www.intel.com/technology/silicon/high-k.htm
  • 3. T. Suntola, J. Antson, U.S. Patent 4 058, 430 (1977)
  • 4. N. Huby, S. Ferrari, E. Guziewicz, M. Godlewski, V. Osinniy, Appl. Phys. Lett. 92, 023502 (2007)
  • 5. M. Godlewski, E. Guziewicz, T. Krajewski, P. Kruszewski, Ł. Wachnicki, K. Kopalko, A. Wójcik, V. Osinniy, Microelectron. Eng. 85, 2434 (2008)
  • 6. G. Łuka, T. Krajewski, A. Szczerbakow, E. Łusakowska, K. Kopalko, E. Guziewicz, Ł. Wachnicki, A. Szczepanik, M. Godlewski, J.D. Fidelus, Acta Phys. Pol. A 114, 1229 (2008)
  • 7. E. Guziewicz, I.A. Kowalik, M. Godlewski, K. Kopalko, V. Osinniy, A. Wójcik, S. Yatsunenko, E. Łusakowska, W. Paszkowicz, J. Appl. Phys. 103, 033515 (2008)
  • 8. T. Krajewski, E. Guziewicz, M. Godlewski, Ł. Wachnicki, I.A. Kowalik, K. Kopalko, A. Wójcik, V. Osinniy, M. Guziewicz, Microelectron. J 40, 293 (2009)
  • 9. A. Szczepanik, Ł. Wachnicki, M. Godlewski, E. Guziewicz, K. Kopalko, E. Janik, E. Łusakowska, A. Czerwiński, M. Płuska, S.A. Yatsunenko, J. Phys., Conf. Ser. 146, 012017 (2009)
  • 10. E. Katsia, N. Huby, G. Tallarida, B. Kutrzeba-Kotowska, M. Perego, S. Ferrari, F.C. Krebs, E. Guziewicz, M. Godlewski, G. Łuka, Appl. Phys. Lett. 94, 143501 (2009)
  • 11. M. Lira-Cantu, F.C. Krebs, Solar Energy Mater. Solar Cells 90, 2076 (2006)
  • 12. 2007 Survey of Energy Resources World Energy Council 2007 (http://www.worldenergy.org/publications/survey_of_energy_resources_2007 )
  • 13. M. Godlewski, E. Guziewicz, G. Łuka, T. Krajewski, M. Łukasiewicz, Ł. Wachnicki, A. Wachnicka, K. Kopalko, A. Sarem, B. Dalati, Thin Solid Films 518, 1145 (2009)

Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv116ns03kz
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