HPM Generation by Tri-Anode Coaxial Vircator

• Authors: H. Shao , G. Liu , Y. Zhang , Z. Yang , J. Sun , Y. Zhang
• Languages of publication: EN

Abstracts

EN

A novel type of coaxial vircator with 3 anodes is proposed. The advantages on high power microwave generation is tested by particle-in-cell simulation and theoretical analysis model is set up as well. The tri-anode coaxial vircator behaves a very stable frequency in the pulse duration. In the tri-anode coaxial vircator, the injecting electron beam is well premodulated in the first anode cavity and forms an inerratic bunch-dispersion mechanism in the second anode cavity; the energy-loss electrons penetrate through the third anode and absorbed by the dumping cavity locates in the centre electrode, which helps keeping the bunch-dispersion cycle undisturbed. A 3.8 GHz tri-anode coaxial vircator is theoretically designed and optimized by particle-in-cell simulation, which gives beam-wave conversion efficiency of over 20% with a stable predominant frequency, in accordance with the particle-in-cell simulation and analytic model.

Keywords

EN

75.47.Gk

Discipline

• 75.47.Gk: Colossal magnetoresistance

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2009
• Volume: 115
• Issue: 6
• Pages: 1047-1049

Dates

published

2009-06

Contributors

author

H. Shao

• Northwest Institute of Nuclear Technology, Shaanxi, Xi'an, 710024 China

author

G. Liu

• Northwest Institute of Nuclear Technology, Shaanxi, Xi'an, 710024 China

author

Y. Zhang

• Northwest Institute of Nuclear Technology, Shaanxi, Xi'an, 710024 China

author

Z. Yang

• Northwest Institute of Nuclear Technology, Shaanxi, Xi'an, 710024 China

author

J. Sun

• Northwest Institute of Nuclear Technology, Shaanxi, Xi'an, 710024 China

author

Y. Zhang

• Northwest Institute of Nuclear Technology, Shaanxi, Xi'an, 710024 China

References

• 1. W. Jiang, W. Woolverton, J. Dickens, M. Kristiansen, in: Proc. IEEE International Conference on Plasma Science (ICOPS99), Monterey, CA, USA, p. 328 (1999)
• 2. E.H. Choi, K.Y. Sung, W. Jeon, in: IEEE 30th International Conference on Vacuum Electronics, p. 341 (2003)
• 3. H. Shao, G. Liu, Z. Yang, IEEE Trans. Plasma Sci. 34, 7 (2006)
• 4. H. Shao, G. Liu, Z. Yang, J. Plasma Phys. 71, 563 (2005)
• 5. H. Shao, G. Liu, Z. Yang, Z.M. Song, C.H. Chen, J. Sun, Y.P. Zhang, J. Plasma Phys. 74, 233 (2008)
• 6. D. Liu, User's manual of code-CHIPIC, 2008.02

Identifiers

DOI

10.12693/APhysPolA.115.1047