Journal
Article title
Authors
Title variants
Languages of publication
Abstracts
Indium tin oxide thin films with different thicknesses were deposited on polymer substrates, held at room temperature, using electron beam evaporation. The dependence of structural properties, optical properties and room temperature resistivity on the indium tin oxide film thickness was studied. X-ray diffraction illustrates the amorphous structure for all the indium tin oxide prepared films. The high roughness of the polymer substrate affects the properties of indium tin oxide films. The transmittance, the resistivity, and the optical band gap decrease with increasing the film thickness while the refractive index increases. The present indium tin oxide films are amorphous, transparent and have relatively low resistivity. These properties are suitable as transparent electrode for organic light-emitting diodes, touch screens, and in piezoelectric applications.
Discipline
- 73.61.-r: Electrical properties of specific thin films(for optical properties of thin films, see 78.20.-e and 78.66.-w; for magnetic properties of thin films, see 75.70.-i)
- 78.66.-w: Optical properties of specific thin films(for optical properties of low-dimensional, mesoscopic, and nanoscale materials, see 78.67.-n; for optical properties of surfaces, see 78.68.+m)
- 61.05.cp: X-ray diffraction
- 07.79.Lh: Atomic force microscopes
Journal
Year
Volume
Issue
Pages
704-708
Physical description
Dates
published
2009-03
received
2008-09-05
(unknown)
2008-10-21
Contributors
author
- Physics Department, Faculty of Science, Sohag University, 82524 Sohag, Egypt
author
- Physics Department, Faculty of Science, Sohag University, 82524 Sohag, Egypt
author
- Physics Department, Faculty of Science, South Valley University, 83523 Qena, Egypt
author
- Physics Department, Faculty of Science, South Valley University, 83523 Qena, Egypt
References
- 1. I. Hamberg, C.G. Granqvist, J. Appl. Phys. 60, R123 (1986)
- 2. K.L. Chopra, S. Major, D.K. Pandya, Thin Solid Films 102, 1 (1983)
- 3. C.G. Granqvist, A. Hultaker, Thin Solid Films 411, 1 (2002)
- 4. C.M. Lampert, Solar Energy Mater. 6, 1 (1981)
- 5. J. Gu, Z. Xiao, M. Xu, G. Wang, Z. Lu, S. Huang, J. Phys. Chem. Solids 59, 27 (1998)
- 6. Y.S. Tsai, F.S. Juang, T.H. Yang, M.C. Yokoyama, L.W. Ji, Y.K. Su, J. Phys. Chem. Solids 69, 764 (2008)
- 7. M. Gaillet, L. Yan, E. Teboul, Thin Solid Films 516, 170 (2007)
- 8. C.-H. Yang, S.-C. Lee, T.-C. Lin, S.-C. Chen, Thin Solid Films 516, 1984 (2008)
- 9. K. Tominaga, T. Takao, A. Fukushima, T. Moriga, I. Nakabayashi, Vacuum 66, 505 (2002)
- 10. K. Tominaga, H. Fukumoto, K. Kondou, Y. Hayashi, K. Murai, T. Moriga, I. Nakabayashi, Vacuum 74, 683 (2004)
- 11. S.-Y. Chu, W. Walter, J.-T. Liaw, J. Eur. Ceram. Soc. 23, 1593 (2003)
- 12. E.D. Kolb, R.A. Laudise, J. Am. Ceram. Soc. 49, 302 (1966)
- 13. M. Fahland, T. Vogt, W. Schoenberger, N. Schiller, Thin Solid Films 516, 5777 (2008)
- 14. L.-J. Meng, J. Gao, M.P. dos Santos, X. Wang, T. Wang, Thin Solid Films 516, 1365 (2008)
- 15. L. Hao, X. Diao, H. Xu, B. Gu, T. Wang, Appl. Surf. Sci. 254, 3504 (2008)
- 16. Y.C. Lin, J.Y. Li, W.T. Yen, Appl. Surf. Sci. 254, 3262 (2008)
- 17. D. Kim, S. Kim, Surf. Coat. Technol. 176, 23 (2003)
- 18. Y.Z. You, Y.S. Kim, D.H. Choi, H.S. Jang, J.H. Lee, D. Kim, Mater. Chem. Phys. 107, 444 (2008)
- 19. S.H. Mohamed, H.M. Ali, H.A. Mohamed, A.M. Salem, Eur. Phys. J. Appl. Phys. 31, 95 (2005)
- 20. L.J. van der Pauw, Philips Res. Rep. 13, 1 (1958)
- 21. H.M. Ali, H.A. Mohamed, S.H. Mohamed, Eur. Phys. J. Appl. Phys. 31, 87 (2005)
- 22. D.R. Cairns, R.P. Witte II, D.K. Sparacin, S.M. Sachsman, D.C. Paine, G.P. Crawford, R.R. Newton, Appl. Phys. Lett. 76, 1425 (2000)
- 23. V. Teixeira, H.N. Cui, L.J. Meng, E. Fortunato, R. Matrins, Thin Solid Films 420-421, 70 (2002)
- 24. S. Ohno, Y. Kawaguchi, A. Miyamura, Y. Sato, P.K. Song, M. Yoshikawa, P. Frach, Y. Shigesato, Sci. Technol. Adv. Mater. 7, 56 (2006)
- 25. S.H. Shin, J.H. Shin, K.J. Park, T. Ishida, O. Tabata, H.H. Kim, Thin Solid Films 341, 225 (1999)
- 26. D.J. Milliron, I.G. Hill, C. Shen, A. Kahn, J. Schwartz, J. Appl. Phys. 87, 572 (2000)
- 27. K. Sugiyama, H. Ishii, Y. Ouchi, K. Seki, J. Appl. Phys. 87, 295 (2000)
- 28. Y.-H. Liau, N.F. Scherer, K. Rhodes, J. Phys. Chem. B 105, 3282 (2001)
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv115n320kz